公开(公告)号：US20190057884A1

公开(公告)日：2019-02-21

申请号：US16102812

申请日：2018-08-14

Applicant: SEMES CO., LTD.

Inventor： MINHEE CHO ,  JAEHYEOK YU ,  SEHOON OH ,  TAE-KEUN KIM ,  YERIM YEON ,  HAE RIM OH ,  JI SOO JEONG

IPC: H01L21/67 ,  H01L21/02

Abstract: Disclosed are relate to an apparatus for supplying a cleaning liquid to a substrate. The cleaning liquid supply unit includes a mixing container having a liquid mixing space in the interior thereof, a first supply member configured to supply a first liquid into the liquid mixing space, a second supply member configured to supply a second liquid that is different from the first liquid into the liquid mixing space, and a mixing member configured to mix the first liquid and the second liquid supplied into the liquid mixing space, and the mixing member may include a circulation line, through which the liquids in the liquid mixing space circulate, and a pressure adjusting member configured to provide a pressure to the liquids such that the liquids in the liquid mixing space flows into the circulation line and adjust the pressure.

公开(公告)号：US20180335661A1

公开(公告)日：2018-11-22

申请号：US15980807

申请日：2018-05-16

Applicant: SEMES CO., LTD.

Inventor： TAE-KEUN KIM ,  JAEHYEOK YU ,  MINHEE CHO ,  SEHOON OH ,  HAE RIM OH ,  JI SOO JEONG

IPC: G02F1/1333 ,  C11D11/00 ,  C11D1/00 ,  B08B3/08

CPC classification number: G02F1/133305 ,  B08B1/001 ,  B08B3/08 ,  C11D1/00 ,  C11D11/0094

Abstract: Disclosed are an apparatus and a method for manufacturing a cleaning solution. The method includes mixing a surfactant chemical and pure water at a first temperature, and after the mixing of the surfactant chemical and the pure water at the first temperature, mixing the surfactant chemical and the pure water while cooling the surfactant chemical and the pure water to a second temperature that is lower than the first temperature.