公开(公告)号：US20250105026A1

公开(公告)日：2025-03-27

申请号：US18810501

申请日：2024-08-20

Applicant: SEMES CO., LTD.

Inventor： Kyung Taek IM ,  Jae Ha KIM ,  Gui Hun KIM

IPC: H01L21/67 ,  G03F7/16

Abstract: An apparatus for processing a substrate includes a heating unit heating the substrate and including a hot plate having a vacuum hole; a fume collection unit including a housing, an inlet portion connected to the vacuum hole and introducing a mixed gas containing fumes generated in heating the substrate within an internal space of the housing, and an outlet portion discharging a gas from which the fumes have been removed to an external space of the housing; a vacuum unit connected to the fume collection unit and vacuum-adsorbing the substrate onto the hot plate when the substrate is heated; and a chilling unit including a cooling body, a coolant inflow fluid passage introducing a coolant into the cooling body, a coolant discharge fluid passage discharging the coolant from the cooling body, and a bypass fluid passage connecting the coolant inflow fluid passage and the coolant discharge fluid passage.

公开(公告)号：US20250068080A1

公开(公告)日：2025-02-27

申请号：US18743089

申请日：2024-06-13

Applicant: SEMES CO., LTD.

Inventor： Kyung Taek IM ,  Jae Ha KIM ,  Seung Hwan LEE ,  Seung Jun LEE

IPC: G03F7/38 ,  H01L21/67

Abstract: Provided is a substrate treatment apparatus including: a cooling chamber accommodating a substrate; and a cooling unit disposed inside the cooling chamber, the cooling unit including a support, two first plates connected to the support to support the substrate and spaced apart from each other in a height direction of the support, and a second plate disposed to move up and down between the two first plates.