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1.
公开(公告)号:US20230313374A1
公开(公告)日:2023-10-05
申请号:US18107558
申请日:2023-02-09
Applicant: SEMES CO., LTD.
Inventor: Sun Il KIM , Sung Nam YOO , Jin Il SUNG
IPC: C23C16/455
CPC classification number: C23C16/45544 , C23C16/45527 , C23C16/45563
Abstract: A flow velocity increasing device of an apparatus for depositing a thin film includes a device body disposed within the chamber and a flow velocity increasing hole portion formed in the device body and tapered in a direction of gas passage so that a flow velocity of passed gas is faster than that externally.
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公开(公告)号:US20240159590A1
公开(公告)日:2024-05-16
申请号:US18507065
申请日:2023-11-12
Applicant: SEMES CO., LTD.
Inventor: Jin Il SUNG , Dong Mok LEE , Sun Il KIM , Ki Ryong LEE
CPC classification number: G01J5/0003 , H01J37/32642 , G01J2005/0077
Abstract: Proposed is an inspection technology for inspecting a focus ring. A device and a method for inspecting the focus ring including a heat transfer member are proposed. The inspection device may include a housing configured to provide inspection space of the focus ring, with a predetermined area of an upper wall of the housing being formed of a transparent material, a hot plate provided in the housing and configured to heat treat the focus ring while the hot plate supports the focus ring, and an inspection unit configured to inspect a connection state between the focus ring and the heat transfer member by obtaining a thermal image of the focus ring after the focus ring is completely heat treated.
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公开(公告)号:US20220139680A1
公开(公告)日:2022-05-05
申请号:US17408383
申请日:2021-08-21
Applicant: SEMES CO., LTD.
Inventor: Dong Mok LEE , Jin Il SUNG
IPC: H01J37/32 , H01L21/683
Abstract: A substrate processing apparatus and a method of fabricating the same are proposed. A bonding layer, by which a chuck body and a base plate of an electrostatic chuck device are bonded, is completely covered using a double-sealing structure in which a covering member for preventing a processing gas from infiltrating into the bonding layer and a sealing member for preventing the bonding layer from being damaged are bonded to each other. The durability and the efficiency of the operation of the electrostatic chuck device are improved.
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