HEATING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

    公开(公告)号:US20230268203A1

    公开(公告)日:2023-08-24

    申请号:US18111537

    申请日:2023-02-18

    CPC classification number: H01L21/67103 H05B3/28 F27B17/0025 G03F7/70875

    Abstract: Provided are a heating unit including an air layer for thermal insulation and a substrate treating apparatus including the heating unit. The substrate treating apparatus includes: a housing providing a space in which a substrate is treated; a heating unit disposed in the housing and heating the substrate; a cooling unit disposed in the housing and cooling the substrate; and a transfer unit for moving the substrate, wherein the heating unit includes: a body including a heater therein; a first air layer provided inside the body for thermal insulation and formed in a first direction as a longitudinal direction thereof; and a second air layer provided inside the body for thermal insulation and formed in a second direction as a longitudinal direction thereof.

Patent Agency Ranking