公开(公告)号：US12125717B2

公开(公告)日：2024-10-22

申请号：US17533348

申请日：2021-11-23

Applicant: SEMES CO., LTD.

Inventor： Ki Sang Eum ,  Jin Ho Choi ,  Byoung Doo Choi ,  Seung Han Lee ,  Sun Wook Jung ,  Si Eun Kim

IPC: H01L21/67 ,  C23C16/44 ,  C23C16/455 ,  H01L21/02 ,  H01L21/687

CPC classification number: H01L21/67051 ,  C23C16/4412 ,  C23C16/45502 ,  H01L21/68764 ,  H01L21/02337

Abstract: An apparatus for treating a substrate, the apparatus comprising: a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit supplying treating liquid to the substrate supported by the support unit; and an exhaust unit exhausting an air flow in the inner space, wherein the processing container includes a bottom wall and a side wall extending from the outside end of the bottom wall, the processing container including a first gas-liquid separator provided at the side wall.

公开(公告)号：US20230268203A1

公开(公告)日：2023-08-24

申请号：US18111537

申请日：2023-02-18

Applicant: SEMES CO., LTD.

Inventor： Jin Taek Oh ,  Jong Seok Seo ,  Seung Han Lee ,  Dongwoon Park

IPC: H01L21/67 ,  H05B3/28 ,  F27B17/00 ,  G03F7/20

CPC classification number: H01L21/67103 ,  H05B3/28 ,  F27B17/0025 ,  G03F7/70875

Abstract: Provided are a heating unit including an air layer for thermal insulation and a substrate treating apparatus including the heating unit. The substrate treating apparatus includes: a housing providing a space in which a substrate is treated; a heating unit disposed in the housing and heating the substrate; a cooling unit disposed in the housing and cooling the substrate; and a transfer unit for moving the substrate, wherein the heating unit includes: a body including a heater therein; a first air layer provided inside the body for thermal insulation and formed in a first direction as a longitudinal direction thereof; and a second air layer provided inside the body for thermal insulation and formed in a second direction as a longitudinal direction thereof.

公开(公告)号：US12230516B2

公开(公告)日：2025-02-18

申请号：US17515737

申请日：2021-11-01

Applicant: SEMES CO., LTD.

Inventor： Jae Oh Bang ,  Young Seo An ,  Seung Han Lee ,  Seung Hwan Lee ,  Hyun Min Kim

IPC: H01L21/67 ,  F27B17/00 ,  F27D7/02 ,  F27D99/00 ,  H01L21/324 ,  H01L21/66 ,  F27D5/00 ,  F27D19/00

Abstract: The inventive concept relates to a substrate treating apparatus including a process chamber having a first and a second body, a support unit supporting a substrate, a heating unit heats the substrate, a driver moves any one of the first body and the second body, an interval state detection unit that detects an interval state between a side wall of the first body and a side wall of the second body when the first and the second body are placed in a process location, and a controller that controls the driver and the interval state detection unit, wherein the interval state detection unit includes a pressure provision line that provides a positive pressure or a negative pressure between the side wall of the first body and the side wall of the second body, and a pressure measurement member that measures a change in a pressure of the pressure provision line.