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公开(公告)号:US20220186379A1
公开(公告)日:2022-06-16
申请号:US17503741
申请日:2021-10-18
Applicant: SEMES CO., LTD.
Inventor: Jin Mo JAE , Seung Hoon OH , Young Seop CHOI , Mi So PARK , Jong Hyeon WOO
IPC: C23C18/16
Abstract: An apparatus for treating a substrate includes a vessel having a sealable process space formed therein in which the substrate is accommodated, a supply port that is provided inside a wall of the vessel and that supplies a process fluid into the process space, an exhaust port provided inside the wall of the vessel and spaced apart from the supply port, and a buffer member provided in the process space, the buffer member being provided in a position overlapping with the supply port and the exhaust port when viewed from above. The buffer member includes a sidewall portion that is located outward of the supply port and the exhaust port and that makes contact with the wall of the vessel and an upper wall portion having a through-hole formed therein to correspond to a center of the substrate, the through-hole forming a straight flow path in an up/down direction.
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公开(公告)号:US20220205782A1
公开(公告)日:2022-06-30
申请号:US17560390
申请日:2021-12-23
Applicant: SEMES CO., LTD.
Inventor: Young Seop CHOI , Yong-Jun SEO , Sang Hyun SON , Sang Min LEE , Jong Hyeon WOO , Hwan Bin KIM
Abstract: A substrate type sensor provided in an atmosphere accompanied by a temperature change to measure a horizontality of a support member that supports a substrate is disclosed. The substrate type sensor may include a base having a shape of the substrate, one or more sensors provided in the base and including 3 or more axis acceleration sensors or 6 or more axis measurement units (IMUs), a receiver configured to receive data collected by the one or more sensors and a power source configured to provide electric power to the one or more sensors and the receiver.
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