Apparatus for treating a substrate

    公开(公告)号:US11829070B2

    公开(公告)日:2023-11-28

    申请号:US17557230

    申请日:2021-12-21

    申请人: SEMES CO., LTD.

    IPC分类号: G03F7/16 B05C11/02

    CPC分类号: G03F7/162 B05C11/02

    摘要: An apparatus for treating a substrate, the apparatus comprising: a treating container having an inner space; a support unit supporting and rotating the substrate in the inner space; and an exhaust unit exhausting an air flow in the inner space, wherein the treating container includes an outer cup providing the inner space; and an inner cup disposed at the inner space and spaced apart from the outer cup, and wherein the outer cup has a protrusion at a side wall thereof.