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1.
公开(公告)号:US11935779B2
公开(公告)日:2024-03-19
申请号:US17513002
申请日:2021-10-28
申请人: SEMES CO., LTD.
发明人: Tae Hoon Lee , Ju Won Kim , Jin Sung Sun , Bo Hee Lee
IPC分类号: H01L21/677 , H01L21/683 , H01L21/687
CPC分类号: H01L21/6838 , H01L21/67778 , H01L21/68707
摘要: Various example embodiments provide a transfer hand for transferring a substrate. The transfer hand for transferring the substrate comprises: a body; and a vacuum assembly installed in the body and providing decompression to the bottom surface of a substrate to support the substrate at the upper part of the body; wherein the vacuum assembly comprises: an vacuum pad with conductivity contacting the substrate; and a sealing member provided between the vacuum pad and the body, the sealing member electrically connected to the vacuum pad; wherein the sealing member is grounded.
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公开(公告)号:US11986967B2
公开(公告)日:2024-05-21
申请号:US17679279
申请日:2022-02-24
申请人: SEMES CO., LTD.
发明人: Tae Kyung Kong , Jin Sung Sun
CPC分类号: B25J9/1697 , B25J5/02 , B25J9/1664 , B25J9/1674 , B25J11/0095
摘要: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a plurality of treating chambers performing a respective treatment on a substrate therein; a transfer chamber having a robot transferring the substrate between the plurality of treating chambers; a detection unit mounted on the robot and configured to detect a substrate state; and a controller for controlling the detection unit, wherein the detection unit comprises: an imaging member for imaging the substrate; and a driving member for moving the imaging member, and wherein the controller controls the detection unit to image and store an image of the substrate at an optimal position and determines whether an image of the substrate is a normal state based on the image obtained in the optimal position, the optimal position determined based on a process variable of the treating chamber.
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公开(公告)号:US11651979B2
公开(公告)日:2023-05-16
申请号:US16935602
申请日:2020-07-22
申请人: SEMES CO., LTD.
发明人: Tae Kyung Kong , Jin Sung Sun , Kiwon Han
IPC分类号: H01L21/67 , B65G47/90 , G03F7/16 , H01L21/687
CPC分类号: H01L21/67196 , B65G47/90 , G03F7/161 , H01L21/67017 , H01L21/68707
摘要: An apparatus for transferring a substrate is provided. A unit for transferring a substrate, includes a support structure, a first hand to place the substrate, a second hand stacked with the first hand and placing the substrate, a first guide rail guiding movement of a first support rod to support the first hand in the support structure, a second guide rail guiding movement of a second support rod in the support structure to support the second hand, and a pressure reducing member reducing pressure of an exhaust fluid passage provided in the support structure. The exhaust fluid passage includes a first fluid passage communicating with the first guide rail, a second fluid passage communicating with the second guide rail, and a third fluid passage formed by combining the first fluid passage with the second fluid passage. The pressure reducing member reduces pressure of the third fluid passage.
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