公开(公告)号：US11935779B2

公开(公告)日：2024-03-19

申请号：US17513002

申请日：2021-10-28

Applicant: SEMES CO., LTD.

Inventor： Tae Hoon Lee ,  Ju Won Kim ,  Jin Sung Sun ,  Bo Hee Lee

IPC: H01L21/677 ,  H01L21/683 ,  H01L21/687

CPC classification number: H01L21/6838 ,  H01L21/67778 ,  H01L21/68707

Abstract: Various example embodiments provide a transfer hand for transferring a substrate. The transfer hand for transferring the substrate comprises: a body; and a vacuum assembly installed in the body and providing decompression to the bottom surface of a substrate to support the substrate at the upper part of the body; wherein the vacuum assembly comprises: an vacuum pad with conductivity contacting the substrate; and a sealing member provided between the vacuum pad and the body, the sealing member electrically connected to the vacuum pad; wherein the sealing member is grounded.

公开(公告)号：US12174553B2

公开(公告)日：2024-12-24

申请号：US17848841

申请日：2022-06-24

Applicant: SEMES CO., LTD.

Inventor： Tae Hoon Lee ,  Jong Gun Lee ,  Ki Sang Eum

IPC: G03F7/00 ,  G03F7/38 ,  H01L21/67

Abstract: Provided is a support unit including a support plate on which the substrate is placed, and a support protrusion provided on the support plate and separating the substrate from the support plate, wherein the support plate includes a first protrusion protruding from an upper surface of the support plate, wherein the first protrusion is provided in a support region provided by the support protrusion.

公开(公告)号：US12142493B2

公开(公告)日：2024-11-12

申请号：US17986894

申请日：2022-11-15

Applicant: SEMES CO., LTD.

Inventor： Young Jun Son ,  Tae Hoon Lee ,  Sung Gyu Lee ,  Hyun Yoon ,  Do Yeon Kim

IPC: H01L21/67 ,  B01D35/02

Abstract: A substrate processing apparatus includes: a nozzle unit configured to discharge a processing liquid to a substrate; a pipe connected to the nozzle unit and a processing liquid supply unit supplying the processing liquid; a charge amount control unit disposed at the pipe, including a filter unit charged with positive charges or negative charges, and including at least one of a control valve, controlling a flow rate of the processing liquid passing through an inside of the filter unit, and a power supply unit, applying a voltage to the filter unit, to control a charge amount of the processing liquid; and a control unit connected to the charge amount control unit.

公开(公告)号：US11960236B2

公开(公告)日：2024-04-16

申请号：US18084381

申请日：2022-12-19

Applicant: SEMES CO., LTD.

Inventor： Young Jun Son ,  Tae Hoon Lee ,  Hyun Yoon ,  Do Yeon Kim

IPC: G03G21/00 ,  G03G15/00 ,  G03G15/02 ,  G03G21/18

CPC classification number: G03G21/1842 ,  G03G15/0233 ,  G03G15/60 ,  G03G15/80 ,  G03G2215/0872 ,  G03G2221/0084 ,  G03G2221/1651

Abstract: Proposed are a home port and a substrate processing apparatus using the same. The home port is installed in the substrate processing apparatus to temporarily mount a nozzle for discharging a process liquid to a substrate, and includes a main body having a space therein, a nozzle holder provided at an upper portion of the main body and configured to mount the nozzle, an inclined surface formed below the nozzle holder in the space, a first supply pipe configured to discharge a rinse liquid to a tip of the nozzle, a second supply pipe configured to inject the rinse liquid into the main body, a conductive wire configured to electrically connect the inclined surface and the first supply pipe, and a first switch installed on the conductive wire.