公开(公告)号：US12087547B2

公开(公告)日：2024-09-10

申请号：US17532082

申请日：2021-11-22

Applicant: SEMES Co., Ltd.

Inventor： Goon Ho Park ,  Jung Mo Gu ,  Ja Myung Gu ,  Hyun Jin Kim

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/32146 ,  H01J37/3244

Abstract: Provided are an apparatus for multi-level pulsing, which minimizes power reflection when generating plasma using an RF signal having a plurality of pulsing levels, and a substrate processing apparatus including the same. The apparatus includes an RF signal generator for generating an RF signal including a first pulsing level and a second pulsing level that are different from each other, and a matching network for receiving the RF signal and providing a corresponding output signal to a load, wherein the RF signal generator generates the RF signal so that a first target impedance of the first pulsing level and a second target impedance of the second pulsing level are different from each other.

公开(公告)号：US11437220B2

公开(公告)日：2022-09-06

申请号：US16907208

申请日：2020-06-20

Applicant: SEMES CO., LTD.

Inventor： Ja Myung Gu ,  Shant Arakel Yan ,  Jung Mo Gu ,  Tae Hoon Jo

IPC: H01J37/32

Abstract: A plasma processing apparatus includes a processing chamber providing space for plasma generation, a chuck member provided in the processing chamber and supporting a substrate, at least two RF power sources providing RF power of different frequencies to the chuck member, a ring member provided to surround the chuck member, an edge electrode arranged in the ring member to be electrically insulated from the chuck member, and a variable impedance circuit being electrically connected to the edge electrode. The variable impedance circuit includes an adjustable impedance configured to control a potential of the edge electrode and a high-frequency stop circuit configured to block high-frequency power from being transmitted to the adjustable impedance.

公开(公告)号：US20220172927A1

公开(公告)日：2022-06-02

申请号：US17532082

申请日：2021-11-22

Applicant: SEMES Co., Ltd.

Inventor： Goon Ho Park ,  Jung Mo Gu ,  Ja Myung Gu ,  Hyun Jin Kim

IPC: H01J37/32

Abstract: Provided are an apparatus for multi-level pulsing, which minimizes power reflection when generating plasma using an RF signal having a plurality of pulsing levels, and a substrate processing apparatus including the same. The apparatus includes an RF signal generator for generating an RF signal including a first pulsing level and a second pulsing level that are different from each other, and a matching network for receiving the RF signal and providing a corresponding output signal to a load, wherein the RF signal generator generates the RF signal so that a first target impedance of the first pulsing level and a second target impedance of the second pulsing level are different from each other.