公开(公告)号：US12237180B2

公开(公告)日：2025-02-25

申请号：US17539070

申请日：2021-11-30

Applicant: SEMES CO., LTD.

Inventor： Jun Young Choi ,  Kyu Hwan Chang

IPC: H01L21/67 ,  B08B7/00

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus comprises a first treating part performing, a liquid treatment on a plurality of substrates in a batch-type treating, method and a second treating part treating the substrates which have been treated at the first treating part, and performing, the liquid treatment or a drying treatment on a single substrate a single-type treating method.

公开(公告)号：US20240042493A1

公开(公告)日：2024-02-08

申请号：US18219588

申请日：2023-07-07

Applicant: SEMES CO., LTD.

Inventor： Myung A. JEON ,  Young Seop Choi ,  Young Jin Kim ,  Eun Hyeok Choi ,  Bok Kyu Lee ,  Je Myung Cha ,  Kyu Hwan Chang

IPC: B08B3/02 ,  B08B3/08

CPC classification number: B08B3/022 ,  B08B3/024 ,  B08B3/08

Abstract: A spray unit in which a plurality of nozzle heads are integrally coupled and a substrate treatment apparatus including the spray unit are provided. The substrate treatment apparatus includes: a substrate support unit supporting a substrate and including a spin head, which rotates the substrate; a treatment liquid retrieval unit retrieving substrate treatment liquids used in treating the substrate; and a spray unit including a plurality of nozzle heads and pipes, which are connected to the nozzle heads, and providing the substrate treatment liquids onto the substrate through the nozzle heads and the pipes, wherein the nozzle heads are moved at the same time.