公开(公告)号：US20250096013A1

公开(公告)日：2025-03-20

申请号：US18779707

申请日：2024-07-22

Applicant: SEMES CO., LTD.

Inventor： Min Kyoung KIM ,  Jun Kil HWANG ,  Hee Hwan KIM

IPC: H01L21/67

Abstract: Disclosed is an apparatus for processing a substrate, the apparatus including: a chamber having a processing space for processing a substrate; a support unit disposed in the processing space and for supporting the substrate; a liquid discharge unit for supplying a treatment solution to the substrate and processing the substrate when processing the substrate; and a liquid supply unit for supplying a treatment solution to the liquid discharge unit, in which the liquid supply unit includes: a tank for storing the treatment solution; a liquid supply line for supplying the treatment solution in the tank to the liquid discharge unit; a vent line connected to the tank to discharge water-containing gas in the tank; a heater for heating the treatment solution in the tank or the treatment solution circulating from the tank; and a condensate discharge line connected to the vent line and for discharging condensate generated from the water-containing gas.