公开(公告)号：US11004675B2

公开(公告)日：2021-05-11

申请号：US16129089

申请日：2018-09-12

Applicant: SEMES CO., LTD.

Inventor： Hae-Won Choi ,  Ki-Moon Kang ,  Kihoon Choi ,  Anton Koriakin ,  Chan Young Heo ,  Jaeseong Lee ,  Kwon Taek Lim ,  Yong Hun Kim ,  Sang Ho Lee

IPC: C11D7/36 ,  H01L21/02 ,  B08B3/08 ,  C09K13/08 ,  H01L21/67 ,  C11D7/34 ,  C11D11/00 ,  H01L21/687 ,  C11D7/50

Abstract: Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The anhydrous substrate cleaning composition includes an etching composite that provides fluorine, a solvent that dissolves the etching composite, and a binder that is a composite including phosphorous.