公开(公告)号：US20210054507A1

公开(公告)日：2021-02-25

申请号：US16997491

申请日：2020-08-19

Applicant: SEMES CO., LTD.

Inventor： Seunghan LEE ,  Jongsu CHOI ,  Jong Seok SEO ,  Junho SEO ,  Younghun JUNG ,  Kyungjin SEO ,  Jung-Hyun LEE ,  Moon Hyung BAE ,  Sang Jin BAE

IPC: C23C16/455 ,  H01L21/67 ,  C23C16/44

Abstract: An embodiment of the inventive concept provides an apparatus for treating a substrate. The apparatus for treating a substrate includes a chamber having a treating space inside the chamber and a gas inlet unit entering a gas into the treating space. The gas inlet unit includes an introduction pipe through which the gas is entered, and a discharging plate in which a discharging hole discharging the gas entered through the introduction pipe is formed. The discharging hole is arranged such that density for each area of the discharging plate is different.