公开(公告)号：US20250085320A1

公开(公告)日：2025-03-13

申请号：US18798841

申请日：2024-08-09

Applicant: SEMES CO,.LTD.

Inventor： Hyo Seong SEONG ,  Tae Hoon JO ,  Soon Min KWON

IPC: G01R27/02 ,  G01R31/56 ,  H01J37/32

Abstract: An inspecting apparatus capable of performing an inspection of equipment without destroying the equipment and semiconductor manufacturing equipment including the inspecting apparatus are provided. The inspecting apparatus includes: a measurement module measuring a first impedance at a first port, and a second impedance at a second port; a comparison module comparing the first and second impedances; and a determination module determining whether the equipment part is operating properly based on a result of the comparison of the first and second impedances, wherein the first impedance includes a first resistance and a first reactance, the second impedance includes a second resistance and a second reactance, and the determination module determines whether the equipment part is operating properly based on at least one of a result of the comparison of the first and second resistances and a result of the comparison of the first and second reactances.

公开(公告)号：US20230194585A1

公开(公告)日：2023-06-22

申请号：US17992972

申请日：2022-11-23

Applicant: SEMES CO., LTD.

Inventor： Tae Hoon JO ,  Hyo Seong SEONG ,  Ji Hyun KIM ,  Ja Myung GU

IPC: G01R27/16

CPC classification number: G01R27/16

Abstract: Proposed are a method and an apparatus for determining a cable length for plasma processing equipment. More particularly, proposed is a method of determining a length of a power supply cable for plasma processing equipment that performs plasma processing through power supply at radio frequencies (RF) of several tens of MHz or more.