公开(公告)号：US11925963B2

公开(公告)日：2024-03-12

申请号：US17826729

申请日：2022-05-27

Applicant: SEMES CO., LTD.

Inventor： Kyeong Min Lee ,  Tae-Keun Kim ,  Min Hee Cho ,  Won Young Kang

IPC: B08B7/00 ,  B08B3/10

CPC classification number: B08B7/0014 ,  B08B3/10

Abstract: The inventive concept provides a substrate treating method. The substrate treating method includes supplying a dissolving solution onto a rotating substrate; and supplying, after the supplying a dissolution solution, a treating liquid including a polymer onto the rotating substrate to form a liquid film.

公开(公告)号：US12159793B2

公开(公告)日：2024-12-03

申请号：US17978328

申请日：2022-11-01

Applicant: SEMES CO., LTD.

Inventor： Min Hee Cho ,  Kyeong Min Lee ,  Won Young Kang ,  Kang Sul Kim ,  Tae-Keun Kim

IPC: H01L21/67 ,  H01L21/02

Abstract: A substrate treating method including removing particles formed on a substrate by continuously performing a process of supplying a treatment liquid including a polymer and a solvent onto the substrate, forming a solidified liquid film by volatilizing the solvent in the treatment liquid, removing the solidified liquid film from the substrate by supplying a stripping liquid onto the substrate, and supplying a rinse liquid onto the substrate may be provided.

公开(公告)号：US10083840B2

公开(公告)日：2018-09-25

申请号：US15166562

申请日：2016-05-27

Applicant: SEMES CO., LTD.

Inventor： Seungho Lee ,  Minhee Cho ,  Ki-Moon Kang ,  Tae-Keun Kim

IPC: H01L21/311 ,  H01L21/67 ,  B01D11/04 ,  B01D1/00 ,  C09K13/08

Abstract: Disclosed is a method of regenerating a phosphoric acid solution from a treatment liquid including silicon (Si), hydrogen fluoride (HF), and phosphoric acid, the method including removing the silicon by supplying hydrogen fluoride corresponding to a preset amount or more to the treatment liquid, removing the hydrogen fluoride by heating the treatment liquid to a boiling point of hydrogen fluoride or higher, and adjusting a temperature and a concentration of the phosphoric acid to preset values.

公开(公告)号：US10049888B2

公开(公告)日：2018-08-14

申请号：US15166562

申请日：2016-05-27

Applicant: SEMES CO., LTD.

Inventor： Seungho Lee ,  Minhee Cho ,  Ki-Moon Kang ,  Tae-Keun Kim

IPC: H01L21/311 ,  H01L21/67 ,  B01D11/04 ,  B01D1/00 ,  C09K13/08

Abstract: Disclosed is a method of regenerating a phosphoric acid solution from a treatment liquid including silicon (Si), hydrogen fluoride (HF), and phosphoric acid, the method including removing the silicon by supplying hydrogen fluoride corresponding to a preset amount or more to the treatment liquid, removing the hydrogen fluoride by heating the treatment liquid to a boiling point of hydrogen fluoride or higher, and adjusting a temperature and a concentration of the phosphoric acid to preset values.