公开(公告)号：US20230313791A1

公开(公告)日：2023-10-05

申请号：US18105878

申请日：2023-02-05

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Woo Sin Jung ,  Woo Ram Lee ,  Byoung Doo Choi ,  Sung Chul Jung

IPC: F04B43/10 ,  F04B43/00 ,  B05B9/04

CPC classification number: F04B43/10 ,  F04B43/0072 ,  B05B9/0406

Abstract: Provided are a pump, an apparatus for supplying a chemical liquid and an apparatus for processing a substrate. The pump includes a tube having elasticity and having a flow path through which a chemical liquid flows in; and a case having an internal space partitioned into at least two chambers through which gas is supplied or discharged, where the at least two chambers cover an outer circumference of the tube. Using the pump, the apparatus for supplying a chemical liquid and the apparatus for processing a substrate, by an operation in which gas is supplied or discharged into each partitioned chamber in the case, by applying or releasing pressure to the outer circumference of each corresponding tube independently without interfering between the internal pressures between the chambers, efficient pumping operation of the pump may be obtained, and precise control of the discharge pressure of the liquid may be implemented.