公开(公告)号：US12125717B2

公开(公告)日：2024-10-22

申请号：US17533348

申请日：2021-11-23

Applicant: SEMES CO., LTD.

Inventor： Ki Sang Eum ,  Jin Ho Choi ,  Byoung Doo Choi ,  Seung Han Lee ,  Sun Wook Jung ,  Si Eun Kim

IPC: H01L21/67 ,  C23C16/44 ,  C23C16/455 ,  H01L21/02 ,  H01L21/687

CPC classification number: H01L21/67051 ,  C23C16/4412 ,  C23C16/45502 ,  H01L21/68764 ,  H01L21/02337

Abstract: An apparatus for treating a substrate, the apparatus comprising: a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit supplying treating liquid to the substrate supported by the support unit; and an exhaust unit exhausting an air flow in the inner space, wherein the processing container includes a bottom wall and a side wall extending from the outside end of the bottom wall, the processing container including a first gas-liquid separator provided at the side wall.

公开(公告)号：US12140868B2

公开(公告)日：2024-11-12

申请号：US17749437

申请日：2022-05-20

Applicant: SEMES CO., LTD.

Inventor： Sun Wook Jung ,  Ki Sang Eum ,  Jin Ho Choi ,  Byoung Doo Choi ,  Hee Man Ahn

IPC: G03F7/16 ,  B05C11/10

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes substrate treating apparatus comprising: a treating container having an inner space; a support unit configured to support and rotate a substrate within the inner space; an exhaust duct configured to exhaust the inner space; and at least one guide member combined with the treating container and configured to guide an airflow within the inner space, and wherein the at least one guide member is arranged such that the airflow within the inner space obliquely flows with respect to a rotation direction of the substrate supported by the support unit when seen from above.

公开(公告)号：US11710654B2

公开(公告)日：2023-07-25

申请号：US17398422

申请日：2021-08-10

Applicant: SEMES CO., LTD.

Inventor： Ki Won Han ,  Byoung Doo Choi

IPC: H01L21/677 ,  H01L21/683 ,  G03F7/00 ,  G03F7/16 ,  H01L21/687

CPC classification number: H01L21/6838 ,  G03F7/162 ,  G03F7/70733 ,  H01L21/67751 ,  H01L21/68742

Abstract: A substrate transport apparatus includes transport hands that clamp substrates by vacuum pressures, respectively, and that are located at different heights, a vacuum pressure supply unit that supplies the vacuum pressures to the transport hands, and a controller that controls the vacuum pressure supply unit to supply the vacuum pressures to the transport hands or interrupt the supply of the vacuum pressures to the transport hands. The controller controls the vacuum pressure supply unit such that the vacuum pressures of the transport hands are turned off at the same height from a substrate support member.

公开(公告)号：US12230510B2

公开(公告)日：2025-02-18

申请号：US17566874

申请日：2021-12-31

Applicant: SEMES CO., LTD.

Inventor： Byoung Doo Choi ,  Jin Ho Choi

IPC: H01L21/47 ,  H01L21/67

Abstract: A substrate treating apparatus is disclosed. The substrate treating apparatus includes a treating container having a treatment space to treat a substrate, a standby port positioned at one side of the treating container to allow a nozzle, which discharges a treatment liquid, to stand by, and a liquid supplying unit moving between the treating container and the standby port and having the nozzle. The standby port includes a nozzle receiving member including a nozzle receiving unit having a receiving space formed inside the nozzle receiving unit to receive the nozzle and a cleaning liquid and a discharge part having a discharge port provided at one side of the nozzle cleaning unit to discharge the cleaning liquid to the nozzle. The discharge port is provided to overlap at least a portion of the nozzle when viewed from above.

公开(公告)号：US12228861B2

公开(公告)日：2025-02-18

申请号：US17522007

申请日：2021-11-09

Applicant: SEMES CO., LTD.

Inventor： Ki Sang Eum ,  Jin Ho Choi ,  Sun Wook Jung ,  Byoung Doo Choi ,  Hee Man Ahn ,  Si Eun Kim

IPC: G03F7/16 ,  C23C16/458

Abstract: An apparatus for treating a substrate includes a treating vessel having an inner space, a support unit that supports and rotates the substrate in the inner space, and an exhaust unit that releases an air flow in the inner space. The exhaust unit includes an air-flow guide duct into which the air flow is introduced in a tangential direction with respect to a rotating direction of the substrate supported on the support unit.

公开(公告)号：US20230313791A1

公开(公告)日：2023-10-05

申请号：US18105878

申请日：2023-02-05

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Woo Sin Jung ,  Woo Ram Lee ,  Byoung Doo Choi ,  Sung Chul Jung

IPC: F04B43/10 ,  F04B43/00 ,  B05B9/04

CPC classification number: F04B43/10 ,  F04B43/0072 ,  B05B9/0406

Abstract: Provided are a pump, an apparatus for supplying a chemical liquid and an apparatus for processing a substrate. The pump includes a tube having elasticity and having a flow path through which a chemical liquid flows in; and a case having an internal space partitioned into at least two chambers through which gas is supplied or discharged, where the at least two chambers cover an outer circumference of the tube. Using the pump, the apparatus for supplying a chemical liquid and the apparatus for processing a substrate, by an operation in which gas is supplied or discharged into each partitioned chamber in the case, by applying or releasing pressure to the outer circumference of each corresponding tube independently without interfering between the internal pressures between the chambers, efficient pumping operation of the pump may be obtained, and precise control of the discharge pressure of the liquid may be implemented.