公开(公告)号：US20230131562A1

公开(公告)日：2023-04-27

申请号：US17969171

申请日：2022-10-19

Applicant: SEMES CO., LTD.

Inventor： Dae Woon LEE ,  Young Ju JO ,  Sung-Gyu LEE

IPC: H01L21/67 ,  H01L21/687

Abstract: Provided is an apparatus for treating a substrate, the apparatus including: a liquid treating chamber for liquid-treating a substrate by supplying a treatment liquid to the substrate; and a liquid supply unit for supplying the treatment liquid to the liquid treating chamber, in which the liquid supply unit includes: a cabinet configured to be mounted with a bottle containing the treatment liquid; and a rotation generating part configured to rotate the bottle so that a direction in which an inlet of the bottle mounted on the cabinet faces is changed.

公开(公告)号：US20240222155A1

公开(公告)日：2024-07-04

申请号：US18137287

申请日：2023-04-20

Applicant: SEMES CO., LTD.

Inventor： Young Seo AN ,  Jae Hoon PARK ,  Young Ju JO ,  Kyung Jin SEO ,  Seo Jung PARK ,  Dae Myeong LEE ,  Jae Hyun LIM ,  Nam Kyu KIM

IPC: H01L21/67 ,  B08B3/02 ,  B08B9/093 ,  H01L21/687

CPC classification number: H01L21/67051 ,  B08B3/022 ,  B08B9/093 ,  H01L21/68764 ,  B08B2209/08

Abstract: A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; and a bowl member surrounding the spin chuck, wherein the bowl member includes: a first bowl including an inclined surface inclined downward in an outward direction and having an upper surface of which at least a portion has a curvature; and an upper base disposed on the first bowl, a space between the upper surface of the first bowl and a lower surface of the upper base forms a first flow passage and at least a portion of the first flow passage is formed in an arc shape along the upper surface of the first bowl, and the rinse liquid is supplied toward the inclined surface of the first bowl through the first flow passage.

公开(公告)号：US20240216965A1

公开(公告)日：2024-07-04

申请号：US18125738

申请日：2023-03-24

Applicant: SEMES CO., LTD.

Inventor： Young Seo AN ,  Jae Hoon PARK ,  Young Ju JO ,  Kyung Jin SEO ,  Seo Jung PARK ,  Dae Myeong LEE ,  Jae Hyun LIM ,  Nam Kyu KIM

IPC: B08B9/093 ,  B08B3/02 ,  G03F7/16

CPC classification number: B08B9/093 ,  B08B3/022 ,  G03F7/168 ,  B08B2203/027 ,  B08B2209/08

Abstract: A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; a first bowl including an inclined surface inclined downward in an outward direction of the spin chuck; and a guide part provided on the inclined surface of the first bowl so as to form a spiral surrounding the spin chuck and guiding a flow of the rinse liquid along the spiral.