Abstract:
Visual and near infrared pixels may have deep photodiodes to ensure sufficient capture of light. The pixels may have a silicon layer that is etched to form a microlens for the pixel. The pixels may include an inversion layer formed over the silicon layer to prevent dark current. Additionally, the pixels may include a conductive layer formed over the inversion layer that further prevents dark current. The conductive layer may be coupled to a bias voltage supply line. The conductive layer may be biased during image acquisition to prevent dark current. During readout, the bias voltage may be pulsed at a lower voltage to ensure all of the collected charge is transferred out of the photodiode during charge transfer.
Abstract:
An image sensor may include an array of image pixels that generate charge in response to light. To determine the color of the light, each image pixel may have a built-in diffusion grating and underlying photodiodes. The diffusion grating may diffract light in a wavelength-dependent manner, and the underlying photodiodes may detect a pattern of the diffracted light. Processing circuitry may store patterns corresponding to known colors. The processing circuitry may compare the detected pattern of the diffracted light to the patterns of light of the known colors, and thereby determine the color of the light through a process such as interpolating between the known patterns. This may eliminate the need for color filters in each pixel and increase the amount of detected light within each pixel. Image sensors having pixels with diffractive gratings may be used in cameras, microscopes, Raman spectrometers, and medical devices.
Abstract:
Implementations of image sensors may include a semiconductor layer including a photodiode, a metal layer or metal silicide layer directly coupled to a first side of the photodiode, and a storage node coupled within a second side of the photodiode. The metal layer or metal silicide layer may be configured to absorb one or more predetermined wavelengths of incident light and correspondingly heat a portion of the semiconductor layer.
Abstract:
In one form, a touch screen includes an optically transmissive medium, first and second light sources, a detection circuit, and a control circuit. The first light source is positioned to emit light across the optically transmissive medium in a first direction, and the second light source is positioned to emit light across the optically transmissive medium in a second direction orthogonal to the first direction. The detection circuit detects standing wave patterns of light emitted by the first and second light sources along the first and second directions. The control circuit is coupled to the detection circuit and measures a first standing wave pattern in an untouched condition, and a second standing wave pattern in a touched condition. The control circuit detects a touch location in response to a difference between the first standing wave pattern and the second standing wave pattern.
Abstract:
An imaging device may have an array of image sensor pixels that includes infrared pixels. The infrared pixels may be formed from a silicon layer and having an etched microlens on an upper surface of the silicon layer. The etched microlens may be formed as concentric circles, concentric squares, or other concentric shapes to improve the focusing of incident light on the photosensitive portion of the silicon layer. Additionally, there may be a plurality of silicon—silicon-oxide interfaces or silicon—silicon-nitride interfaces between the etched microlens and the silicon layer. These interfaces may increase the absorption of infrared light by the underlying silicon layer. Similar interfaces may be formed on a lower surface, either as an etched region or as an additional dielectric layer. Alternatively or additionally, the infrared pixels may include a conductive patch between the silicon layer and microlens that similarly increases the absorption of infrared light.
Abstract:
An image sensor may include a pixel array with global shutter phase detection pixels. The global shutter phase detection pixels may include global shutter charge storage regions. To prevent the global shutter charge storage regions from being exposed to incident light, a shielding layer may be provided. The shielding layer may also cover portions of underlying photodiodes to produce an asymmetric response to incident light in the underlying photodiodes. The shielding layer may be formed as backside trench isolation with an absorptive metal. The absorptive metal may absorb incident light, reducing the likelihood of the incident light reaching the charge storage regions. An additional absorptive layer may also be provided on or in the shielding layer.
Abstract:
A backside illumination image sensor with an array of image sensor pixels is provided. Each pixel may include a photodiode, a storage diode, and associated circuitry formed in a front side of a semiconductor substrate. In accordance with an embodiment, a trench isolation structure may be formed directly over the storage diode but not over the photodiode from a back side of the substrate. The backside trench isolation structure may be filled with absorptive material and can optionally be biased to a ground or negative voltage level. A light shielding layer may also be formed over the backside trench isolation structure on the back side of the substrate. The light shielding layer may be formed from absorptive material or reflective material, and may also be biased to a ground or negative voltage level.
Abstract:
An image sensor including a semiconductor layer. A light absorber layer couples with the semiconductor layer at a pixel of the image sensor and absorbs incident light to substantially prevent the incident light from entering the semiconductor layer. The light absorber layer heats a depletion region of the semiconductor layer in response to absorbing the incident light, creating electron/hole pairs. The light absorber layer may include one or more narrow bandgap materials.
Abstract:
Implementations of semiconductor devices may include: a microlens array formed of a plurality of microlenses. Each of the plurality of microlenses may have a first side and a second side. A layer of polymer may be formed over the second side of each of the plurality of microlenses and a low index box may be between adjacent microlenses of the plurality of microlenses.
Abstract:
In one form, an optical touch screen system includes a semiconductor body forming a hybrid display and image sensor comprising a plurality of display pixels interspersed with a plurality of image sensor pixels, a spatial light modulator overlying a surface of the hybrid display and image sensor, and a control circuit for driving the plurality of display pixels with a first pattern and measuring a second pattern of the plurality of image sensor pixels, the control circuit analyzing the second pattern to detect a position of an object and selectively detecting a touch location in response to the second pattern.