SUCTION STAGE, LAMINATION DEVICE, AND METHOD FOR MANUFACTURING LAMINATED SUBSTRATE
    1.
    发明申请
    SUCTION STAGE, LAMINATION DEVICE, AND METHOD FOR MANUFACTURING LAMINATED SUBSTRATE 审中-公开
    吸收级,层压装置和制造层压基板的方法

    公开(公告)号:US20160225655A1

    公开(公告)日:2016-08-04

    申请号:US15021516

    申请日:2014-09-24

    Abstract: According to the embodiment, a suction stage includes a mounting section configured to mount a first substrate, and an evacuation section configured to evacuate air between the first substrate and the mounting section. The mounting section includes a first wall part provided on an outer peripheral side of one end surface of the mounting section and shaped like a ring, and a second wall part provided inside the first wall part and shaped like a ring. The evacuation section includes a first control valve provided between the evacuation section and a first region between the first wall part and the second wall part, a second control valve provided between the evacuation section and a second region inside the second wall part, and a control section configured to control the first control valve and the second control valve. The control section is configured to control the first control valve and the second control valve so that suction of the first substrate and deactivation of the suction of the first substrate are alternately performed in at least one of the first region and the second region. While the suction of the first substrate is deactivated in one of the first region and the second region, the suction of the first substrate is performed in the other region.

    Abstract translation: 根据本实施方式,吸入台具备:搭载第一基板的安装部和构成为在第一基板与安装部之间抽空的排气部。 安装部包括:第一壁部,其设置在安装部的一个端面的外周侧,成形为环状;第二壁部,设置在第一壁部的内部,形状为环状。 排气部包括设置在排气部与第一壁部与第二壁部之间的第一区域之间的第一控制阀,设置在排气部与第二壁部内部的第二区域之间的第二控制阀, 该部分被配置为控制第一控制阀和第二控制阀。 控制部被配置为控制第一控制阀和第二控制阀,使得在第一区域和第二区域中的至少一个中交替地执行第一基板的吸入和第一基板的抽吸的停用。 当在第一区域和第二区域中的一个区域中第一基板的抽吸被停用时,第一基板的吸力在另一区域中执行。

    SUBSTRATE TREATMENT DEVICE, PEELING METHOD FOR LAMINATED SUBSTRATE, AND METHOD FOR REMOVING ADHESIVE
    2.
    发明申请
    SUBSTRATE TREATMENT DEVICE, PEELING METHOD FOR LAMINATED SUBSTRATE, AND METHOD FOR REMOVING ADHESIVE 审中-公开
    基板处理装置,层压基板的剥离方法和移除粘合剂的方法

    公开(公告)号:US20160225613A1

    公开(公告)日:2016-08-04

    申请号:US15021182

    申请日:2014-09-24

    Abstract: The embodiment of a substrate treatment device includes a treatment bath configured to store a treatment liquid in which a treatment object is to be immersed, a transport section configured to transport the treatment object, a temperature control section provided in at least one of the treatment bath and a position spaced from the treatment bath and configured to perform at least one of heating and cooling of the treatment object. the treatment object is at least one of: a laminated substrate including a device substrate, a support substrate, and an adhesive provided between the device substrate and the support substrate, the device substrate with the adhesive attached thereto, and the support substrate with the adhesive attached thereto.

    Abstract translation: 基板处理装置的实施方式包括:处理槽,其配置为储存待处理对象物被浸渍的处理液,配置成输送处理对象物的输送部,设置在至少一个处理槽中的温度控制部 以及与治疗浴间隔开并且被配置为执行治疗对象的加热和冷却中的至少一个的位置。 处理对象是以下中的至少一种:包括装置基板,支撑基板和设置在装置基板和支撑基板之间的粘合剂的层压基板,附着有粘合剂的装置基板和具有粘合剂的支撑基板 附在其上。

    Suction stage, lamination device, and method for manufacturing laminated substrate

    公开(公告)号:US10586727B2

    公开(公告)日:2020-03-10

    申请号:US15021516

    申请日:2014-09-24

    Abstract: A suction stage may include a mounting section configured to mount a first substrate, and an evacuation section configured to evacuate air between the first substrate and the mounting section. The mounting section includes a ring-shaped first wall part, and a ring-shaped second wall part inside the first wall part. The evacuation section includes a first control valve between the evacuation section and a first region between the first and second wall parts, a second control valve between the evacuation section and a second region inside the second wall part, and a control section configured to control the valves. The control section is configured to control the valves so that suction and non-suction of the first substrate are alternately performed in at least one of the regions. Thus, suction of the first substrate may be deactivated in one of the regions, while the suction is active in the other region.

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