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公开(公告)号：US11988683B2
公开(公告)日：2024-05-21
申请号：US17017853
申请日：2020-09-11
Applicant: SHIMADZU CORPORATION
Inventor： Mio Tsukahara , Kenta Terashima , Yoshitake Yamamoto , Daisuke Oda
CPC classification number: G01N35/1002 , G01N35/1011 , H01J49/164
Abstract: A moving mechanism and a spray mechanism are controlled to spray a reagent from a nozzle to a sample plate while relatively moving the sample plate and the nozzle. The reagent is applied to an entire application area by moving a spray spot of the reagent sprayed from the nozzle, on the sample plate from a start point to an end point. At this time, the spray spot is moved in a sample placement area after a spray amount of the reagent from the nozzle and a moving speed of the spray spot become constant.
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