公开(公告)号：US11988683B2

公开(公告)日：2024-05-21

申请号：US17017853

申请日：2020-09-11

Applicant: SHIMADZU CORPORATION

Inventor： Mio Tsukahara ,  Kenta Terashima ,  Yoshitake Yamamoto ,  Daisuke Oda

IPC: G01N35/10 ,  H01J49/16

CPC classification number: G01N35/1002 ,  G01N35/1011 ,  H01J49/164

Abstract: A moving mechanism and a spray mechanism are controlled to spray a reagent from a nozzle to a sample plate while relatively moving the sample plate and the nozzle. The reagent is applied to an entire application area by moving a spray spot of the reagent sprayed from the nozzle, on the sample plate from a start point to an end point. At this time, the spray spot is moved in a sample placement area after a spray amount of the reagent from the nozzle and a moving speed of the spray spot become constant.

公开(公告)号：US11607701B2

公开(公告)日：2023-03-21

申请号：US16927283

申请日：2020-07-13

Applicant: SHIMADZU CORPORATION

Inventor： Kazuteru Takahashi ,  Kenta Terashima

IPC: B05B15/522 ,  G01N1/31 ,  B05B15/555 ,  G01N35/10 ,  H01J49/04 ,  H01J49/16

Abstract: Provided is a sample pretreatment device configured to apply, to the surface of a sample, a solution in which a predetermined substance is dissolved or dispersed. In order to properly and efficiently unclog a nozzle due to the deposition of the crystal of a matrix substance, the device includes a spray unit (3) including a solution tube (32) for the solution to pass through, a gas tube (33) for a spray gas to pass through, and a nozzle part (30) configured to spray the solution arriving at the terminal end of the solution tube by ejection of the spray gas through the gas tube, as well as a cleaning liquid supplier (4, 41) configured to put a cleaning liquid on an opening of the nozzle part from outside the spray unit.