Abstract:
ICP-MS includes: an ion source to ionize a sample component; a vacuum chamber (4-into which generated ions are introduced; a cell inside the vacuum chamber to bring the ions into contact with a predetermined gas; a mass spectrometer unit at a later stage of the vacuum chamber to perform mass spectrometry of ions having passed through the cell or ions derived from the ions; a first gas introduction unit to introduce a predetermined gas into the cell; a second gas introduction unit to introduce a predetermined gas into the vacuum chamber and outside the cell; and controllers to control gas introduction such that a gas is introduced by the first gas introduction unit when analysis is performed while bringing a gas into contact with ions, whereas a gas is introduced by the second gas introduction unit when analysis is performed without bringing a gas into contact with ions.
Abstract:
An ICP-MS includes a control device, a collision cell and a first electrode that are provided on an optical axis of plasma, and a second electrode, a mass separation device, and a detector that are provided on a detection axis. The control device sets, as an axis-shifting voltage to be applied to each electrode of the first electrode and the second electrode in a gas-present mode, the voltage obtained by adding an offset determined according to a mass-to-charge ratio of a target ion to an initial voltage in a gasless mode.
Abstract:
A mass spectrometer 10 includes: an insertion port 1 through which a sample plate 8 is to be inserted; a reading device 6 including: a light emitter 61 disposed to emit light in such a manner that the light falls onto the sample plate 8 inserted through the insertion port 1; and a light receiver 62 for receiving reflected by or transmitted through the sample plate 8 to read an identifier 80 provided on the sample plate 8; an analyzer 101 for performing a mass spectrometric analysis on a sample 9 placed on the sample plate 8, to obtain analysis information of the sample 9; and a storage section 51 for storing identification information 800 of the sample plate 8 and the analysis information 100 of the sample 9 placed on the sample plate 8, which are associated with each other, the identification information 800 being indicated by the identifier 80 read by the reading device 6, and the analysis information 100 being obtained by the analyzer 101.
Abstract:
In a high-frequency power supply for plasma having a housing and a high-frequency circuit substrate placed inside the housing, elements for supplying a high-frequency current to a high-frequency inductive coil are mounted on the high-frequency circuit substrate , a cooling block for cooling the high-frequency circuit substrate is provided, and a coolant path a for allowing a coolant to flow through is formed inside the cooling block so that the coolant is allowed to flow through the coolant path when a high-frequency current is supplied and the coolant is not allowed to flow through the coolant path when a high-frequency current is not supplied.
Abstract:
Provided is a mass spectrometer including a vacuum chamber containing a cell used for causing ions originating from a sample to come in contact with a predetermined gas supplied from a gas supplier (20), which includes a three-way valve (204) configured to selectively send the gas into either a first passage (22) for sending the predetermined gas to the cell or a second passage (23) for discharging the gas into vacuum state. The mass spectrometer also includes a controller configured to control the three-way valve so as to send the gas into the second passage during an analysis period in which ions are not caused to come in contact with the gas within the cell and/or during a non-analyzing period, as well as to send the gas into the first passage during an analysis period in which ions are caused to come in contact with the gas within the cell.
Abstract:
A vacuum processing apparatus 100 includes: a vacuum chamber 1; a stage 2 placed inside the vacuum chamber 1, on which an object to be processed is placed; an internal guide rail 31 laid in the vacuum chamber 1 to guide the stage 2; a through-hole 103 made in a sidewall 102 of the vacuum chamber 1; a connecting rod 4 coupled to the stage 2 at one end and inserted in the through-hole 103, the other end being disposed outside the vacuum chamber 1; a movable member 5 connected to the other end of the connecting rod 4; a driving mechanism 8 disposed outside the vacuum chamber 1 to move the movable member 5; and a bellows 6 disposed between the movable member 5 and the sidewall 102, the bellows 6 following the movement of the movable member 5 while maintaining airtightness of the vacuum chamber 1.
Abstract:
In a high-frequency power supply for plasma having a housing and a high-frequency circuit substrate placed inside the housing elements for supplying a high-frequency current to a high-frequency inductive coil are mounted on the high-frequency circuit substrate, a cooling block for cooling the high-frequency circuit substrate, a fan for sending air to the elements on the high-frequency circuit substrate as wind are further provided, and fins for allowing air to flow through so that the air is cooled are formed on the surface of the cooling block. The housing is provided with an air path for supplying the air that has flown through the fins to the absorbing side of the fan.
Abstract:
When a gas is supplied from a gas supply unit (19) to a collision cell (11) in detection of a first target ion, before detection of the first target ion, a controller (22) applies a voltage having a first adjustment voltage value to an electrode located on a downstream side of the collision cell (11) in an ion traveling direction, the first adjustment voltage value being obtained by adding an adjustment value to a first detection voltage value corresponding to the first target ion, and in detection of the first target ion, the controller (22) applies a voltage having the first detection voltage value to the electrode located on the downstream side of the collision cell (11) in the ion traveling direction. The adjustment value is a value indicating a polarity opposite to a polarity of the first target ion.
Abstract:
A mass spectrometer includes: a roughing vacuum pump; a turbomolecular pump; a first chamber from which a gas is discharged by the roughing vacuum pump; a second chamber into which hydrogen gas is introduced, the second chamber being located at a stage subsequent to the first chamber; a third chamber provided with a detector, the third chamber being located at a stage subsequent to the second chamber; a gas-discharge tube that forms a gas-discharge flow from the first chamber to the roughing vacuum pump; and a gas-discharge tube that forms a gas-discharge flow from each of the second chamber and the third chamber to the gas-discharge tube by the turbomolecular pump. The mass spectrometer introduces, into the gas-discharge tube, an additional gas having a molecular weight higher than a molecular weight of the hydrogen gas.
Abstract:
A mass spectrometer includes a housing, which has a wall and is provided with a mass spectrometry portion, a base portion, a sampling unit removably attached to the base portion, and an exhaust path for discharging gas derived from a sample. The exhaust path includes a first path provided in the sampling unit, a second path provided in the base portion, and a third path provided in the housing. The base portion has a first base portion fixed to the wall and a second base portion with the second path provided therein. The second base portion is removably fixed to the first base portion.