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公开(公告)号：US09910349B2
公开(公告)日：2018-03-06
申请号：US15018137
申请日：2016-02-08
发明人： Jun Horikoshi , Yu Yanase
IPC分类号： G03F1/62 , G03F1/64 , C09J183/08 , C09J133/08
CPC分类号： G03F1/64 , C09J133/08 , C09J183/08 , G03F1/62
摘要： A pellicle is proposed in which the agglutinant layer which enables the pellicle to adhere to a photomask is doped with a de-foaming agent which depends on a reactive fluorine-modified silicone oil for its anti-foaming performance, and typically such reactive fluorine-modified silicone oil has a vinyl group at both ends of its molecular chain.
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2.发明授权公开(公告)号：US10126645B2
公开(公告)日：2018-11-13
申请号：US15337747
申请日：2016-10-28
发明人： Jun Horikoshi
IPC分类号： G03F1/62 , G03F1/64 , C09J183/00 , C09J163/00
摘要： A pellicle is proposed in which an adhesive layer is formed of an adhesive which undergoes a hardness change at a rate from −50% through +50% of its initial hardness, measured after curing, when it is let to sit in atmosphere of a temperature of 300 degrees C. for 7 days on end; the rate of hardness change being defined by a following equation: Rate of hardness change (%)={(hardness after the sitting)−(initial hardness before the sitting)}÷initial hardness before the sitting)×100.
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公开(公告)号：US09977326B2
公开(公告)日：2018-05-22
申请号：US15296507
申请日：2016-10-18
发明人： Jun Horikoshi
CPC分类号： G03F1/64 , G03F7/2004
摘要： A pellicle is proposed in which an adhesive layer which adheres a pellicle film to a pellicle frame is mixed (filled) with powder of thermally conductive material such as metallic compound so that the heat generated by the strong EUV ray is quickly passed to the pellicle frame from the pellicle film lest the latter is deformed by the heat.
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公开(公告)号：US20150286133A1
公开(公告)日：2015-10-08
申请号：US14645856
申请日：2015-03-12
发明人： Jun Horikoshi
CPC分类号： G03F1/64 , G03F1/142 , G03F1/22 , G03F1/62 , G03F7/2002
摘要： There is provided a pellicle having a frame 12, a film 11 and an adhesive 13 for bonding the film 11 to the frame 12, and this adhesive 13 is a silicone compound having a low outgassing tendency and high heat resistance; in a better mode case, it can maintain its adhesive strength at temperatures 100-200 degrees C. and it exhibits results of TML being 1.0% or lower and CVCM being 0.1% or lower when tested in accordance with ASTM E595-93; thus this pellicle is useful for EUV light exposure lithography.
摘要翻译： 提供了具有框架12，薄膜11和用于将薄膜11粘合到框架12的粘合剂13的防护薄膜组件，该粘合剂13是具有低脱气倾向和高耐热性的硅酮化合物; 在更好的模式情况下，它可以在100-200℃的温度下保持其粘合强度，并且当根据ASTM E595-93测试时，其显示TML的结果为1.0％或更低，CVCM为0.1％或更低。 因此该防护薄膜可用于EUV曝光光刻。
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公开(公告)号：US20150085265A1
公开(公告)日：2015-03-26
申请号：US14467256
申请日：2014-08-25
发明人： Jun Horikoshi
IPC分类号： G03F1/64
摘要： There is provided a pellicle having a frame, a membrane and an agglutinant layer (adhesive to bond the pellicle on a photo mask) in which the release liner (detachable sheet) laid to the agglutinant layer for protection thereof is controlled to have a surface roughness of 5-30 micrometers on the side of the liner which is attached to the agglutinant layer, with a result that the releasability of the liner is improved suitably.
摘要翻译： 提供一种防护薄膜组件，其具有框架，膜和凝集层（粘合剂以将防护薄膜组合在光掩模上），其中放置到用于保护的凝集层的剥离衬垫（可拆卸片材）被控制为具有表面粗糙度 在附着于凝集层的衬里侧上为5-30微米，结果衬垫的释放性得到适当改善。
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公开(公告)号：US09759996B2
公开(公告)日：2017-09-12
申请号：US14791896
申请日：2015-07-06
发明人： Jun Horikoshi
摘要： The present invention is directed to a pellicle frame of a pellicle for use in photolithography, comprising: a coating of a layer containing a para-xylylene-based polymer. The invention can inhibit release of sulfate ions, ammonium ions and so on from the pellicle frame and thereby reduce the occurrence of haze under exposure environment.
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公开(公告)号：US20150286134A1
公开(公告)日：2015-10-08
申请号：US14658672
申请日：2015-03-16
发明人： Jun Horikoshi
CPC分类号： G03F1/64 , C09K11/06 , C09K2211/1011 , C09K2211/1033 , G03F1/142 , G03F1/62
摘要： There is provided a pellicle 1 for lithography having a frame 12, a film 11 and an agglutinant layer 13 (an adhesive to bond the pellicle on a photomask), in which the agglutinant layer 13 is doped with a luminescence material so as to facilitate the inspection of the quality of the adhesion between the agglutinant layer 13 and the photomask; preferably the luminescence material is a kind that glows in response to UV irradiation, and a preferable dosage of the luminescence material is no less than 0.01 mass % but less than 1.0 mass %.
摘要翻译： 提供了一种用于光刻的防护薄膜1，其具有框架12，膜11和凝集层13（粘合剂以粘合光掩模上的防护薄膜），其中凝集层13掺杂有发光材料，以便于 检查凝集层13和光掩模之间的粘附质量; 优选地，发光材料是响应于UV照射而发光的那种，并且发光材料的优选剂量不小于0.01质量％但小于1.0质量％。
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公开(公告)号：US10353283B2
公开(公告)日：2019-07-16
申请号：US15638956
申请日：2017-06-30
发明人： Yu Yanase , Jun Horikoshi
IPC分类号： G03F1/64 , C08F220/18 , C09J133/12
摘要： Provided are an adhesive comprising substantially no surface modifier and leaving a less residue behind after a pellicle is separated; a pellicle; and a method of selecting an adhesive leaving a less residue behind. More specifically, provided are an adhesive for a pellicle having a ratio of a peel strength to a tensile strength of from 0.10 to 0.33; a pellicle comprising a pellicle frame, a pellicle film provided over an upper end face of the pellicle frame, and the adhesive adhered to a lower end face of the pellicle frame; and a method of selecting an adhesive, comprising the steps of: measuring a peel strength and a tensile strength of an adhesive, and selecting an adhesive having a ratio of the former to the latter of from 0.10 to 0.33 as the adhesive for a pellicle.
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公开(公告)号：US09703188B2
公开(公告)日：2017-07-11
申请号：US14931267
申请日：2015-11-03
发明人： Jun Horikoshi , Yu Yanase
CPC分类号： G03F1/64 , C09K11/7734 , G01N21/70
摘要： A pellicle is proposed in which the agglutinant layer which enable the pellicle to be adhered to a photomask is doped with a mechanoluminescent material so that the uniformness of the thickness of the agglutinant layer can be confirmed, when the pellicle is adhered to the photomask, by observing visually or by CCD camera for any irregularity in the pattern of the light emitted from the agglutinant layer.
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公开(公告)号：US09581896B2
公开(公告)日：2017-02-28
申请号：US14658672
申请日：2015-03-16
发明人： Jun Horikoshi
CPC分类号： G03F1/64 , C09K11/06 , C09K2211/1011 , C09K2211/1033 , G03F1/142 , G03F1/62
摘要： There is provided a pellicle 1 for lithography having a frame 12, a film 11 and an agglutinant layer 13 (an adhesive to bond the pellicle on a photomask), in which the agglutinant layer 13 is doped with a luminescence material so as to facilitate the inspection of the quality of the adhesion between the agglutinant layer 13 and the photomask; preferably the luminescence material is a kind that glows in response to UV irradiation, and a preferable dosage of the luminescence material is no less than 0.01 mass % but less than 1.0 mass %.
摘要翻译： 提供了一种用于光刻的防护薄膜1，其具有框架12，膜11和凝集层13（粘合剂以粘合光掩模上的防护薄膜），其中凝集层13掺杂有发光材料，以便于 检查凝集层13和光掩模之间的粘附质量; 优选地，发光材料是响应于UV照射而发光的那种，并且发光材料的优选剂量不小于0.01质量％但小于1.0质量％。
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