公开(公告)号：US10569291B2

公开(公告)日：2020-02-25

申请号：US15102471

申请日：2014-05-23

Applicant: SHINCRON CO., LTD.

Inventor： Shingo Samori ,  Shinichi Takase ,  Satoshi Sugawara ,  Ekishu Nagae ,  Yousong Jiang

IPC: B05B17/04 ,  B05B16/60 ,  B05D5/08 ,  B05B9/04 ,  B05B13/02 ,  B05D1/02 ,  B05D3/04 ,  B05B14/20 ,  C03C17/30

Abstract: A method for forming a thin film having durability at a low cost is provided. A film formation apparatus 1 is used in the film formation method. The apparatus 1 comprises a vacuum container 11 in which a substrate 100 is placed at a lower part, a vacuum pump 15 for exhaust inside the container 11, a storage container 23 for storing a coating agent 21 provided outside the container 11, and a nozzle having an ejection part 19 capable of ejecting the coating agent 21 at its one end. A solution including two or more kinds of materials is used as the coating agent 21. The solution is ejected to the substrate in an atmosphere at a pressure set based on vapor pressures of respective materials composing the solution.

公开(公告)号：US20170100736A1

公开(公告)日：2017-04-13

申请号：US15102850

申请日：2015-04-24

Applicant: SHINCRON CO., LTD.

Inventor： Shingo Samori ,  Shinichi Takase ,  Satoshi Sugawara ,  Ekishu Nagae ,  Yousong Jiang

IPC: B05B17/04 ,  B05B15/04 ,  B05D1/02

CPC classification number: B05B17/04 ,  B05B9/04 ,  B05B13/0221 ,  B05B14/20 ,  B05B16/60 ,  B05D1/02 ,  B05D3/0493 ,  B05D5/083 ,  B05D2203/35 ,  C03C17/30 ,  C03C2217/76 ,  C03C2218/15

Abstract: A method for forming a thin film having durability at a low cost is provided. A film formation apparatus 1 is used in the film formation method. The apparatus 1 comprises a vacuum container 11 in which a substrate 100 is placed at a lower part, a vacuum pump 15 for exhaust inside the container 11, a storage container 23 for storing a coating agent 21 provided outside the container 11, and a nozzle having an ejection part 19 capable of ejecting the coating agent 21 at its one end. A solution including two or more kinds of materials including a first material (S1) and a second material (S2) having a higher vapor pressure (P2) than a vapor pressure (P1) of the Si is used as the coating agent 21. The coating agent 21 is ejected to the substrate in an atmosphere with a pressure higher than P1 and lower than P2.

公开(公告)号：US20170072418A1

公开(公告)日：2017-03-16

申请号：US15102471

申请日：2014-05-23

Applicant: SHINCRON CO., LTD.

Inventor： Shingo Samori ,  Shinichi Takase ,  Satoshi Sugawara ,  Ekishu Nagae ,  Yousong Jiang

IPC: B05B13/02 ,  B05D1/02 ,  B05D3/04

CPC classification number: B05B17/04 ,  B05B9/04 ,  B05B13/0221 ,  B05B14/20 ,  B05B16/60 ,  B05D1/02 ,  B05D3/0493 ,  B05D5/083 ,  B05D2203/35 ,  C03C17/30 ,  C03C2217/76 ,  C03C2218/15

Abstract: A method for forming a thin film having durability at a low cost is provided. A film formation apparatus 1 is used in the film formation method. The apparatus 1 comprises a vacuum container 11 in which a substrate 100 is placed at a lower part, a vacuum pump 15 for exhaust inside the container 11, a storage container 23 for storing a coating agent 21 provided outside the container 11, and a nozzle having an ejection part 19 capable of ejecting the coating agent 21 at its one end. A solution including two or more kinds of materials is used as the coating agent 21. The solution is ejected to the substrate in an atmosphere at a pressure set based on vapor pressures of respective materials composing the solution.

Abstract translation: 提供了一种以低成本形成耐久性的薄膜的方法。 在成膜方法中使用成膜装置1。 装置1包括其中底部100放置在下部的真空容器11，用于容器11内的排气的真空泵15，用于储存设置在容器11外部的涂料21的储存容器23和喷嘴 具有能够在其一端喷射涂布剂21的喷射部19。 使用包含两种或更多种材料的溶液作为涂布剂21.在基于构成溶液的各种材料的蒸气压设定的压力的气氛中将溶液喷射到基板。

公开(公告)号：US20170066001A1

公开(公告)日：2017-03-09

申请号：US15102499

申请日：2015-05-01

Applicant: SHINCRON CO., LTD.

Inventor： Shingo Samori ,  Shinichi Takase ,  Satoshi Sugawara ,  Ekishu Nagae ,  Yousong Jiang

IPC: B05B15/12 ,  B05B9/04 ,  B05B13/02 ,  B05D1/02

CPC classification number: B05B17/04 ,  B05B9/04 ,  B05B13/0221 ,  B05B14/20 ,  B05B16/60 ,  B05D1/02 ,  B05D3/0493 ,  B05D5/083 ,  B05D2203/35 ,  C03C17/30 ,  C03C2217/76 ,  C03C2218/15

Abstract: A method for forming a thin film having durability at a low cost is provided. A film formation apparatus 1 is used in the film formation method. The apparatus 1 comprises a vacuum container 11, in which a substrate 100 is placed at a lower part, a vacuum pump 15 for exhaust inside the container 11, a storage container 23 for storing a coating agent 21 provided outside the container 11, a nozzle having an ejection part 19 capable of ejecting the coating agent 21 at its one end and a pressurizing means (a gas supply source 29, etc.) for pressurizing a liquid surface of a coating agent 21 stored in the storage container 23. A solution, which includes two or more kinds of materials including a first material (S1) and a second material (S2) having a higher vapor pressure (P2) than a vapor pressure (P1) of the S1 and has a concentration of the first material being 0.01 wt % or more, is used as the coating agent 21. The coating agent 21 is ejected to a substrate in an atmosphere with a pressure of P2 or higher (excepting pressures higher than P2 by one digit or more) and with an ejection pressure of 0.05 to 0.3 MPa.

Abstract translation: 提供了一种以低成本形成耐久性的薄膜的方法。 在成膜方法中使用成膜装置1。 装置1包括：底部100放置在下部的真空容器11，容器11内部的排气用真空泵15，储存容器11内设置的涂布剂21的收纳容器23，喷嘴 具有能够在其一端喷射涂布剂21的喷射部19和用于对储存容器23中储存的涂布剂21的液面加压的加压装置（气体供给源29等） 其包括具有比S1的蒸气压（P1）高的蒸气压（P2）的第一材料（S1）和第二材料（S2）的两种或更多种材料，并且第一材料的浓度为0.01 使用重量％以上的涂料21作为涂布剂21.涂布剂21在压力为P2以上的气氛（除了高于P2的压力一位以上）喷射到基板上，喷射压力为 0.05〜0.3MPa。

公开(公告)号：US20140199493A1

公开(公告)日：2014-07-17

申请号：US14238586

申请日：2012-09-26

Applicant: SHINCRON CO., LTD.

Inventor： Ichiro Shiono ,  Tatsuya Hayashi ,  Yousong JIANG ,  Ekishu Nagae ,  Mitsuhiro Miyauchi ,  Shingo Samori

IPC: C23C14/58

CPC classification number: C23C14/58 ,  C23C14/0031 ,  C23C14/022 ,  C23C14/24 ,  C23C14/541 ,  C23C14/546

Abstract: Provided is a film formation apparatus with which an anti-fouling film having high usability and antiwear performance may be formed efficiently. According to a film formation apparatus (1) of the present invention, a substrate holder (12) which comprises a basal body holding surface for folding a plurality of substrates (14) is disposed in a vacuum container (10) in a rotatable manner. The film formation apparatus (1) comprises an evaporation source (34) which is disposed in the vacuum container (10) in such a manner that a larger amount of film formation material may be supplied to a first area (A3) that is part of the basal body holding surface than to an area other than the first area (remaining area) when operated toward the substrate holder (12) in a rotation stop state; and an ion source (38) which is disposed in the vacuum container (10) in such a manner, arrangement, and/or direction that energetic particle irradiation may be made toward only a second area (A2) that is part of the basal body holding surface when operated toward the substrate holder (12) in the rotation stop state.

Abstract translation: 提供一种成膜装置，可以有效地形成具有高可用性和抗磨损性能的防污膜。 根据本发明的成膜装置（1），包括用于折叠多个基板（14）的基体保持面的基板保持件（12）以可旋转的方式设置在真空容器（10）中。 成膜装置（1）包括：蒸发源（34），其设置在真空容器（10）中，使得可以将更多量的成膜材料供应到第一区域（A3），第一区域 所述基体保持面比所述第一区域以外的区域（剩余面积）在朝向所述基板保持件（12）旋转停止的状态下操作; 以及离子源（38），其以这样一种方式，排列和/或方向设置在真空容器（10）中，可以仅向作为基体的一部分的第二区域（A2）形成高能粒子照射 在旋转停止状态下朝向基板保持件（12）操作时的保持面。