Abstract:
A process for producing an ultrafine mixed-crystal oxide characterized by producing an ultrafine mixed crystal oxide comprising primary particles in a mixed crystal state with a BET specific surface area of 10 to 200 m2/g, comprising the step of subjecting a halogenated metal to high temperature oxidation with an oxidizing gas to produce a metal oxide by a vapor phase production method, wherein said halogenated metal is in the form of a mixed gas (a mixed halogenated metal gas) comprising at least two compounds having a different metal elements selected from the group consisting of chlorides, bromides, and iodides of titanium, silicon, and aluminum, and said mixed halogenated metal gas and said oxidizing gas are independently preheated to 500null C. or more prior to a reaction, a ultrafine mixed crystal oxide obtained by the process, and use of the oxide.
Abstract:
The present invention provides a process for producing ultrafine particulate complex oxide containing titanium oxide, including vapor-phase producing a complex oxide containing titanium oxide having a BET specific surface area of about 5 to about 200 m2/g, where a starting material gas containing titanium tetrachloride and an oxidizing gas are preheated to about 700null C. or more, and are reacted with a solution or a slurry of a salt containing a metallic element. The present invention also provides an ultrafine particulate complex oxide containing titanium oxide obtained by the process, and use of the oxide.