公开(公告)号：US20190256361A1

公开(公告)日：2019-08-22

申请号：US16308323

申请日：2017-06-06

Applicant: SHOWA DENKO K.K.

Inventor： Kiyoshi NOMURA ,  Hiroshi UCHIDA ,  Yoshimitsu ISHIHARA ,  Yumiko NAKAJIMA ,  Shigeru SHIMADA ,  Kazuhiko SATO

IPC: C01B33/04 ,  B01J29/48 ,  B01J29/46 ,  B01D53/22 ,  B01J35/10

Abstract: An object of the present invention is to provide an oligosilane production method with which a target oligosilane can be selectively produced. Oligosilanes can be efficiently produced at an improved selectivity for a target oligosilane by using, as a raw material, not only monosilane but also an oligosilane with a smaller number of silicon atoms than the target oligosilane or conversely an oligosilane with a larger number of silicon atoms than the target oligosilane.