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    WAFER MAPPING APPARATUS AND LOAD PORT INCLUDING SAME
    1.
    发明申请
    WAFER MAPPING APPARATUS AND LOAD PORT INCLUDING SAME 有权
    WAFER映射设备和负载端口，包括它们

    公开(公告)号：US20150308812A1

    公开(公告)日：2015-10-29

    申请号：US14689551

    申请日：2015-04-17

    申请人： SINFONIA TECHNOLOGY CO., LTD.

    发明人： Mitsuo NATSUME ,  Masahiro Osawa ,  Toshimitsu Morihana ,  Mitsutoshi Ochiai

    IPC分类号： G01B11/00

    CPC分类号： G01B11/002 ,  G01B11/14 ,  G01B11/22 ,  G01B11/24 ,  G01N21/64 ,  G01N35/1016 ,  G01N2035/1025 ,  H01L21/67265

    摘要： The left-right span between a light projection section 5a and a light receiving section 5b of a mapping sensor 5 having an optical axis L1 extending in a left-right horizontal direction is arranged to be narrower than the span of a front opening of a open cassette 12 which is a smaller one of differently-sized containers conveyed to a load port, and the mapping sensor is attached to a mapping device 4. A first protrusion sensor 6 having an optical axis L2 extending in the left-right horizontal direction is attached to the mapping device 4 to be separated from the mapping sensor 5 in a moving direction of the mapping sensor 5. Furthermore, a second protrusion sensor 7 having an optical axis extending in the up-down moving direction of the mapping sensor 5 is provided.

    摘要翻译： 在具有沿左右水平方向延伸的光轴L1的映射传感器5的光投射部分5a和光接收部分5b之间的左右跨度布置成比开口的前开口的跨度窄 盒式录像带12是不同尺寸的容器中较小的一个传送到负载端口的盒式磁带12，并且映射传感器附接到映射装置4.附接有沿左右水平方向延伸的光轴L2的第一突出传感器6 到映射装置4，以在映射传感器5的移动方向上与映射传感器5分离。此外，提供具有在映射传感器5的上下移动方向上延伸的光轴的第二突起传感器7。

    END STRUCTURE OF NOZZLE, PURGING DEVICE, AND LOAD PORT
    2.
    发明申请
    END STRUCTURE OF NOZZLE, PURGING DEVICE, AND LOAD PORT 有权
    喷嘴，净化装置和装载端口的结构

    公开(公告)号：US20160276188A1

    公开(公告)日：2016-09-22

    申请号：US15072823

    申请日：2016-03-17

    申请人： SINFONIA TECHNOLOGY CO., LTD.

    发明人： Toshimitsu MORIHANA ,  Yuki MATSUMOTO ,  Mitsuo NATSUME

    IPC分类号： H01L21/673 ,  H01L21/677

    CPC分类号： H01L21/67393

    摘要： There is provided an end structure of a nozzle 11 including a gas-flow passage 13 communicable with an opening 104 provided through a bottom of a container 100 configured to contain an object, the nozzle 11 configured so that gas is injected into or discharged from the container 100 through the gas-flow passage 13 and the opening 104. The end structure includes a contact portion 19 provided at an upper end portion of the nozzle 11 and around the gas-flow passage 13, and the contact portion 19 is configured to be brought into contact with a contacted portion 103 provided around the opening 104. The contact portion 19 includes a flat portion 19b and protruding portions 19a and 19c each protruding upward relative to the flat portion 19b, and the flat portion 19b is made of material softer than that of the protruding portions 19a and 19c.

    摘要翻译： 提供了喷嘴11的端部结构，其包括气体流路13，气体通道13可与通过构造成容纳物体的容器100的底部设置的开口104连通，喷嘴11被构造成使得气体被喷射到 容器100通过气体流路13和开口104.端部结构包括设置在喷嘴11的上端部并且在气体流路13周围的接触部19，接触部19构成为 与设置在开口104周围的被接触部分103接触。接触部分19包括平坦部分19b和相对于平坦部分19b向上突出的突出部分19a和19c，并且平坦部分19b由比较 突出部分19a和19c。