公开(公告)号：US20240026155A1

公开(公告)日：2024-01-25

申请号：US18212820

申请日：2023-06-22

申请人： SK Innovation Co., Ltd. ,  SK ie technology Co., Ltd.

发明人： Byung Guk Kim ,  Jin Su Park ,  Sun Kug Kim ,  Sang Yoon Park ,  Hyun Suk Chung

IPC分类号： C08L79/08 ,  G02B1/04 ,  G02B1/14 ,  G02B1/111 ,  C08K5/3475 ,  C08J7/046

CPC分类号： C08L79/08 ,  G02B1/04 ,  G02B1/14 ,  G02B1/111 ,  C08K5/3475 ,  C08J7/046 ,  C08L2203/16 ,  C08L2201/08 ,  C08L2201/10 ,  C08J2379/08

摘要： A polyamideimide film including a polyamideimide resin including units derived from dianhydride, aromatic diamine, and aromatic diacid dichloride; and a UV blocker including a benzotriazole-based compound is provided. The polyamideimide film according to one embodiment has UV weather resistance for a long time, low haze and a low yellow index, and a high modulus, so that optical and mechanical properties may be simultaneously implemented.