System and method for characterizing a process by which a semiconductor device is formed
    3.
    发明授权
    System and method for characterizing a process by which a semiconductor device is formed 有权
    用于表征形成半导体器件的工艺的系统和方法

    公开(公告)号:US09372222B2

    公开(公告)日:2016-06-21

    申请号:US14179632

    申请日:2014-02-13

    发明人: Jung Hee Lee

    IPC分类号: G01R31/26 H03F1/30

    摘要: A semiconductor process sensor to characterize a semiconductor process by which the semiconductor process sensor was formed. The semiconductor process sensor includes a constant reference voltage source to provide a constant reference voltage signal, a process sensing resistor, a constant current source, and an analog-to-digital converter. The process sensing resistor has a first terminal electrically coupled to the constant reference voltage source and a second terminal to provide a sensed voltage signal, the process sensing resistor having a resistance that is dependent on at least one variation in the semiconductor process used to form the semiconductor process sensor. The constant current source is electrically coupled to the second terminal of the process sensing resistor. The analog-to-digital converter is coupled to the second terminal of the process sensing resistor to provide at least one output signal characterizing the semiconductor process by which the semiconductor process sensor was formed.

    摘要翻译: 一种用于表征半导体工艺传感器形成的半导体工艺的半导体工艺传感器。 半导体工艺传感器包括用于提供恒定参考电压信号的恒定参考电压源,过程感测电阻器,恒定电流源和模数转换器。 过程感测电阻器具有电耦合到恒定参考电压源的第一端子和用于提供感测电压信号的第二端子,该过程感测电阻器具有取决于半导体工艺中的至少一个变化的电阻,所述半导体工艺用于形成 半导体工艺传感器。 恒流源电耦合到处理感测电阻器的第二端子。 模数转换器耦合到处理感测电阻器的第二端,以提供表征形成半导体工艺传感器的半导体工艺的至少一个输出信号。