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1.
公开(公告)号:US20170221948A1
公开(公告)日:2017-08-03
申请号:US15489265
申请日:2017-04-17
Inventor: Axel Crocherie , Michel Marty , Jean-Luc Huguenin , Sébastien Jouan
IPC: H01L27/146 , H01L29/66
CPC classification number: H01L29/66977 , H01L27/1462 , H01L27/14621 , H01L27/14625 , H01L27/14627 , H01L27/14629 , H01L27/14645 , H01L27/14685 , H01L2027/11892 , H04N2209/045
Abstract: An integrated image sensor may include adjacent pixels, with each pixel including an active semiconductor region including a photodiode, an antireflection layer disposed above the photodiode, a dielectric region disposed above the antireflection layer, an optical filter disposed above the dielectric region, and a diffraction grating disposed in the antireflection layer. The diffraction grating includes an array of pads.
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2.
公开(公告)号:US09985119B2
公开(公告)日:2018-05-29
申请号:US15489265
申请日:2017-04-17
Inventor: Axel Crocherie , Michel Marty , Jean-Luc Huguenin , Sébastien Jouan
IPC: H01L21/00 , H01L31/113 , H01L29/66 , H01L27/146
CPC classification number: H01L29/66977 , H01L27/1462 , H01L27/14621 , H01L27/14625 , H01L27/14627 , H01L27/14629 , H01L27/14645 , H01L27/14685 , H01L2027/11892 , H04N2209/045
Abstract: An integrated image sensor may include adjacent pixels, with each pixel including an active semiconductor region including a photodiode, an antireflection layer disposed above the photodiode, a dielectric region disposed above the antireflection layer, an optical filter disposed above the dielectric region, and a diffraction grating disposed in the antireflection layer. The diffraction grating includes an array of pads.
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3.
公开(公告)号:US09685472B2
公开(公告)日:2017-06-20
申请号:US15050579
申请日:2016-02-23
Applicant: STMICROELECTRONICS SA , STMICROELECTRONICS (CROLLES 2) SAS
Inventor: Axel Crocherie , Michel Marty , Jean-Luc Huguenin , Sébastien Jouan
IPC: H01L21/00 , H01L31/113 , H01L27/146 , H01L29/66
CPC classification number: H01L29/66977 , H01L27/1462 , H01L27/14621 , H01L27/14625 , H01L27/14627 , H01L27/14629 , H01L27/14645 , H01L27/14685 , H01L2027/11892 , H04N2209/045
Abstract: An integrated image sensor may include adjacent pixels, with each pixel including an active semiconductor region including a photodiode, an antireflection layer above the photodiode, a dielectric region above the antireflection layer and an optical filter to pass incident luminous radiation having a given wavelength. The antireflection layer may include an array of pads mutually separated by a dielectric material of the dielectric region. The array may be configured to allow simultaneous transmission of the incident luminous radiation and a diffraction of the incident luminous radiation producing diffracted radiations which have wavelengths below that of the incident radiation, and are attenuated with respect to the incident radiation.
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