公开(公告)号：US20180166318A1

公开(公告)日：2018-06-14

申请号：US15892696

申请日：2018-02-09

Applicant: STMicroelectronics SA

Inventor： Didier Dutartre ,  Herve Jaouen

IPC: H01L21/762 ,  H01L21/02

CPC classification number: H01L21/7624 ,  H01L21/02381 ,  H01L21/0245 ,  H01L21/02488 ,  H01L21/02502 ,  H01L21/02505 ,  H01L21/02513 ,  H01L21/02532 ,  H01L21/02595 ,  H01L21/763 ,  H01L29/04

Abstract: A semiconductor wafer suitable for fabricating an SOI substrate is provided by: producing a first layer of polycrystalline semiconductor on a top side of a semiconductor carrier; then forming an interface zone on a top side of the first layer, wherein the interface zone has a structure different from a crystal structure of the first layer; and then producing a second layer of polycrystalline semiconductor on the interface zone.

公开(公告)号：US10535552B2

公开(公告)日：2020-01-14

申请号：US15892696

申请日：2018-02-09

Applicant: STMicroelectronics SA

Inventor： Didier Dutartre ,  Herve Jaouen

IPC: H01L21/762 ,  H01L21/02

Abstract: A semiconductor wafer suitable for fabricating an SOI substrate is provided by: producing a first layer of polycrystalline semiconductor on a top side of a semiconductor carrier; then forming an interface zone on a top side of the first layer, wherein the interface zone has a structure different from a crystal structure of the first layer; and then producing a second layer of polycrystalline semiconductor on the interface zone.

公开(公告)号：US20170103913A1

公开(公告)日：2017-04-13

申请号：US15129328

申请日：2015-03-27

Applicant: STMicroelectronics SA

Inventor： Didier Dutartre ,  Herve Jaouen

IPC: H01L21/762 ,  H01L21/02

CPC classification number: H01L21/7624 ,  H01L21/02381 ,  H01L21/0245 ,  H01L21/02488 ,  H01L21/02502 ,  H01L21/02505 ,  H01L21/02513 ,  H01L21/02532 ,  H01L21/02595 ,  H01L21/763 ,  H01L29/04

Abstract: A semiconductor wafer suitable for fabricating an SOI substrate is provided by: producing a first layer of polycrystalline semiconductor on a top side of a semiconductor carrier; then forming an interface zone on a top side of the first layer, wherein the interface zone has a structure different from a crystal structure of the first layer; and then producing a second layer of polycrystalline semiconductor on the interface zone.

公开(公告)号：US09929039B2

公开(公告)日：2018-03-27

申请号：US15129328

申请日：2015-03-27

Applicant: STMicroelectronics SA

Inventor： Didier Dutartre ,  Herve Jaouen

IPC: H01L29/04 ,  H01L21/763 ,  H01L21/762 ,  H01L21/02

CPC classification number: H01L21/7624 ,  H01L21/02381 ,  H01L21/0245 ,  H01L21/02488 ,  H01L21/02502 ,  H01L21/02505 ,  H01L21/02513 ,  H01L21/02532 ,  H01L21/02595 ,  H01L21/763 ,  H01L29/04

Abstract: A semiconductor wafer suitable for fabricating an SOI substrate is provided by: producing a first layer of polycrystalline semiconductor on a top side of a semiconductor carrier; then forming an interface zone on a top side of the first layer, wherein the interface zone has a structure different from a crystal structure of the first layer; and then producing a second layer of polycrystalline semiconductor on the interface zone.