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公开(公告)号:US3736342A
公开(公告)日:1973-05-29
申请号:US3736342D
申请日:1971-07-27
申请人: SUMITOMO CHEMICAL CO
CPC分类号: C07C29/54 , C07C31/02 , C07C31/12 , C07C31/125
摘要: A TRIALKOXYLAUMINUM IS PRODUCED FROM AN ALKYLALUMINUM COMPOUND,
R1-AL(-R2)-R3
WHEREIN R1 AND R2 REPRESENT ALKYL GROUP HAVING 2 TO 30 CARBON ATOMS, AND R3 AN ALKYL OR ALKOXY GROUPS HAVING 2 TO 30 CARBON ATOMS THROUGH OXIDATION BY CONTACTING THE ALKYLALUMINUM COMPOUND WITH A MOLECULAR OXYGEN-CONTAINING GAS IN A STATE OF FILM HAVING A THICKNESS OF NOT MORE THAN 5 MM., PREFERABLY NOT MORE THAN 3 MM., AT -20* TO 150*C., PREFERABLE 0* TO 100*C. UNDER A PRESSURE OF NOT MORE THAN 50 KG./CM.2 ABSOLUTE, PREFERABLE 0.5 TO 40 KG./CM.2 ABSOLUTE.-
公开(公告)号:US3786080A
公开(公告)日:1974-01-15
申请号:US11547171
申请日:1971-02-16
申请人: SUMITOMO CHEMICAL CO
发明人: ICHIKI E , KADOKURA H , IIDA K , MATSUI A
IPC分类号: C07F5/06
CPC分类号: C07F5/065
摘要: AN ALKYLALUMINUM COMPOUND IS PRODUCED CONTINOUSLY AND ECONOMICALLY WITH LESS ALUMINUM LOSS BY REACTING HYDROGEN AND AN ALKYLALUMINUM COMPOUND OR FURTHER AN OLEFIN IN ADDITION THERETO, WITH AN ALLOY CONTAINING ALUMINUM AND SILICON AND HAVING A SIZE LARGER THAN THAT OF A METAL RESIDUE TO BE WITHDRAWN OUT OF A REACTION SYSTEM IN A COLUMN-TYPE REACTOR THROUGH PASSAGE OF SAID HYDROGEN, ALKYLALUMINUM COMPOUND AND THE OLEFIN, IF NECESSARY THROUGH THE RECATOR PACKED WITH THE ALLOY FROM THE BOTTOM UPWARDS AT A TEMPERATURE OF 50*-200*C. UNDER A PRESSURE OF 10-300KG/CM2, WITHDRAWING A METAL RESIDUE MADE TO PASS SUBSTANTIALLY THROUGH 32-100 MESH SIZES BY THE REACTION OUT OF THE REACTION SYSTEM TOGETHER WITH THE ALKYLALUMINUM COMPOUND AND SEPARATING THE ALKYLALUMINUM COMPOUND FROM THE METAL RESIDUE.
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公开(公告)号:US3720698A
公开(公告)日:1973-03-13
申请号:US3720698D
申请日:1971-06-07
申请人: SUMITOMO CHEMICAL CO
CPC分类号: C07C29/54 , C07C31/12 , C07C31/125
摘要: WHEREIN R1 REPRESENTS AN ALKYL GROPU HAVING 2-30 CARBON ATOMS AND R2 AND R3 REPRESENT ALKYL GROUPS OR ALKOXY GROUPS HAVING 2-30 CARBON ATOMS THROUGH OXIDATION BY INTRODUCING THE ALKYLALUMINUM COMPOUND DILUTED WITH AT LEAST 600 G. OF A SOLVENT HAVING A BOILING POINT OF -50*150*C. AND BEING SUBSTANTIALLY INERT TO THE ALKYLALUMINUM COMPOUND, PER GRAM EQUIVALENT OF ALKYL GROUPS OF THE ALKYLALUMINM COMPOUND, INTO A MOLECULAR OXYGENCONTAINING GAS UNDER A PARTIAL PRESSURE OF OXYGEN OF AT LEAST 0.1 KG/CM.2 ABSOLTUT AT A TEMPERATURE OF -20-* 150*C., PREFERABLY 0* - 100*C. UNDER A PRESSURE OF NOT MORE THAN 50 KG./CM.2 ABSOLUYE, PREFERABLY 0.5-40 KG./ CM.2 ABSOLUTE IN A FINELY DIVIDED DROPLET STATE THEREBY TO OXIDIZE THE ALKYLALUMINUM COMPOUND.
R1-AL(-R2)-R3
A TRIALKOXYALUMIM IS PRODUCED FROM AN ALKYLALUMINUM COMPOUND,-
公开(公告)号:US3770789A
公开(公告)日:1973-11-06
申请号:US3770789D
申请日:1971-02-16
申请人: SUMITOMO CHEMICAL CO
发明人: ICHIKI E , IIADA K , MATSUI A , KADOKURA H
CPC分类号: C07F5/065
摘要: ALUMINUM OR ITS ALLOY IS ACTIVATED BY HEATING ALUMINUM OR ITS ALLOY AT 70 -200*C. IN THE PRESENCE OF AN ACTIVATING AGENT COMPRISING (1) A COMPOUND REPRESENTED BY THE GENERAL FORMULA R2AIX, WHEREIN R REPRESENTS AN ALKYL, ARYL, ARALKYL OR ALKARYL GROUP AND X REPRESENTS A HYDROGEN ATOM, AN ALKYL, ARYL, ARALKYL,ALKARYL, ALKOXY, AROXY, ARALKOXY OR ALKAROXY GROUP OF A HALOGEN ATOM. (2) A METAL OF GROUPS IA AND IIA OF THE PERIODIC TABLE OR ITS COMPOUND, AND (3) METALLIC COOPER OR ITS COMPOUND.
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公开(公告)号:US3753768A
公开(公告)日:1973-08-21
申请号:US3753768D
申请日:1970-10-30
申请人: SUMITOMO CHEMICAL CO
摘要: Aluminum plating according to which aluminum film formed has no cracks and pin-holes on its surface, a uniform thickness, excellent luster and is strongly bonded to the substrate can be attained by heat treating a substrate covered with aluminum at 400* C the melting point of aluminum for 10 seconds 30 minutes in an inert atmosphere said heat treatment being preceded by or followed by treating of the covered substrate with a surface treating agent comprising active hydrogen-containing compound, oxygen or halogen and thereafter taking out thus treated substrate into the air.
摘要翻译: 通过在400℃下热处理覆盖有铝的基板,可以获得在400℃下热处理覆盖有铝的基板,从而可以获得在其表面上没有形成铝膜的表面上没有裂纹和针孔的铝电镀,均匀的厚度,优异的光泽并且牢固地结合到基板上 的铝在惰性气氛中持续10分钟30分钟,所述热处理之前或之后是用包含含活性氢的化合物,氧或卤素的表面处理剂处理被覆盖的基材,然后将如此处理的基材取出到空气中 。
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