公开(公告)号：US09099219B2

公开(公告)日：2015-08-04

申请号：US13967628

申请日：2013-08-15

Applicant: SUMITOMO METAL MINING CO., LTD.

Inventor： Yoshiyuki Abe ,  Riichiro Wake ,  Masakazu Kuwahara ,  Kentaro Sogabe ,  Azusa Oshiro ,  Hisaki Yada

IPC: H01B1/08 ,  H01L31/02 ,  H01L31/0224 ,  C23C14/34 ,  C23C30/00 ,  C04B35/01 ,  C23C14/08 ,  H01L31/0749 ,  H01L31/18

CPC classification number: H01B1/08 ,  C04B35/01 ,  C04B2235/3229 ,  C04B2235/3256 ,  C04B2235/3258 ,  C04B2235/3286 ,  C04B2235/3293 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/608 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6567 ,  C04B2235/658 ,  C04B2235/6585 ,  C04B2235/6586 ,  C04B2235/77 ,  C04B2235/786 ,  C04B2235/9646 ,  C23C14/08 ,  C23C14/3414 ,  C23C30/005 ,  H01L31/022466 ,  H01L31/022475 ,  H01L31/0749 ,  H01L31/1884 ,  Y02E10/541

Abstract: An oxide evaporation material according to the present invention includes a sintered body containing indium oxide as a main component thereof and cerium with a Ce/In atomic ratio of 0.001 to 0.110. The L* value in the CIE 1976 color space is 62 to 95. The oxide evaporation material with the L* value of 62 to 95 has an optimal oxygen amount. Accordingly, even when a small amount of an oxygen gas is introduced into a film-formation vacuum chamber, a transparent conducting film having a low resistance and a high transmittance in the visible to near-infrared region is formed by vacuum deposition methods. Since the amount of the oxygen gas introduced is small, the difference in composition between the film and the evaporation material is made small. This reduces the variations in composition and characteristics among films formed in large quantities.

Abstract translation: 根据本发明的氧化物蒸发材料包括以氧化铟为主要成分的烧结体和Ce / In原子比为0.001至0.110的铈。 CIE 1976色空间的L *值为62〜95.L *值为62〜95的氧化物蒸发材料具有最佳的氧量。 因此，即使少量的氧气被引入到成膜真空室中，也可以通过真空沉积法形成在可见光到近红外区域具有低电阻和高透射率的透明导电膜。 由于引入的氧气的量少，所以膜和蒸发材料之间的组成差异变小。 这减少了大量形成的膜之间的组成和特性的变化。