公开(公告)号：US20170287764A1

公开(公告)日：2017-10-05

申请号：US15510224

申请日：2015-09-24

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Hitoshi KOUNO ,  Kentaro TAKAHASHI ,  Fumihiro GOBOU

IPC: H01L21/683 ,  H05K7/20 ,  H02N13/00

CPC classification number: H01L21/6833 ,  B23Q3/15 ,  H01L21/3065 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68735 ,  H02N13/00 ,  H05K7/20009

Abstract: The present invention provides an electrostatic chuck device capable of increasing the electrostatic adsorptive force for a focus ring and uniformly cooling the focus ring. In an electrostatic chuck device (10) of the present invention, a mounting table (11) has a holder (15) being provided in the periphery of a placing surface (24a) along the circumferential direction of a focus ring (12) and electrostatically adsorbing the focus ring (12), the holder (15) has a pair of banks (16) being provided in the circumferential direction and being for placing the focus ring (12) thereon, and an annular groove (17) formed between these banks, and, in at least a bank (16A) on an outer circumferential position of the focus ring (12) among the pair of the banks (16), a micro-protruding part including a plurality of micro-protrusions is formed on a surface facing the focus ring (12), or convex parts (18) are provided on a bottom (17a) of the groove (17). The convex parts (18) do not come into contact with the focus ring, and the pair of the banks (16) or the plurality of the micro-protrusions comes into contact with the focus ring (12) and electrostatically adsorbs the focus ring (12) in coordination with the convex parts (18).

公开(公告)号：US20170243778A1

公开(公告)日：2017-08-24

申请号：US15515083

申请日：2015-09-09

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Hitoshi KOUNO ,  Fumihiro GOBOU

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6833 ,  H01L21/3065 ,  H01L21/67103 ,  H01L21/6831 ,  H01L21/6875 ,  H02N13/00

Abstract: An electrostatic chuck device that adsorbs a plate-like specimen with an electrostatic adsorption electrode and cools the plate-like specimen, including an electrostatic chuck portion, a forming material of which is a ceramic sintered body, and that has one main surface that is a placement surface on which the plate-like specimen is placed, in which a plurality of protrusions supporting the plate-like specimen are provided on the placement surface, the protrusion has a top surface that is in contact with the plate-like specimen and supports the plate-like specimen, and has a cross-sectional area that gradually increases vertically downward from a height position of the top surface, and a cross-sectional area at a distance 0.6 μm vertically downward from a lower end of the top surface of the protrusion is 110% or less of a cross-sectional area of a lower end of the top surface.