公开(公告)号：US20200343125A1

公开(公告)日：2020-10-29

申请号：US16958094

申请日：2018-12-11

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Yuuki KINPARA ,  Ryuuji HAYAHARA ,  Kazunori ISHIMURA ,  Hitoshi KOUNO

IPC: H01L21/683 ,  H02N13/00 ,  H01L21/67 ,  H01L21/687

Abstract: An electrostatic chuck device includes: an electrostatic chuck part having, as a main surface, a mounting surface on which a plate-shaped sample is mounted, and provided with an electrostatic attraction electrode; a base part which is disposed on a side opposite to the mounting surface with respect to the electrostatic chuck part and is configured to cool the electrostatic chuck part; a heater which is disposed in a layered manner between the electrostatic chuck part and the base part or in an interior of the electrostatic chuck part; and an adhesion layer which bonds and integrates the electrostatic chuck part and the base part together, in which the electrostatic chuck part is provided with a first through-hole, the base part is provided with a second through-hole communicating with the first through-hole, the adhesion layer is provided with a third through-hole communicating with the first through-hole and the second through-hole, a tubular insulator is fixed in the second through-hole, and an end of the insulator which is located on the electrostatic chuck part side is separated from the electrostatic chuck part with a space interposed therebetween.

公开(公告)号：US20190019714A1

公开(公告)日：2019-01-17

申请号：US16070478

申请日：2017-01-18

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Mamoru KOSAKAI ,  Yukio MIURA ,  Kazunori ISHIMURA ,  Keisuke MAEDA ,  Hitoshi KOUNO ,  Yuuki KINPARA ,  Shinichi MAETA ,  Tomomi ITO

IPC: H01L21/683 ,  H01L21/67 ,  H02N13/00

Abstract: An electrostatic chuck device includes: an electrostatic chuck part which incorporates an internal electrode for electrostatic attraction and has a placing surface on which a plate-like sample is placed; a base part which cools the electrostatic chuck part; and an adhesion layer which bonds the electrostatic chuck part and the base part to integrate the parts together, in which a first through-hole is provided in the electrostatic chuck part, a second through-hole that communicates with the first through-hole is provided in the base part, a tubular insulator is fixed in the second through-hole, an annular sealing member is sandwiched between the electrostatic chuck part and a distal end surface of the insulator, wherein the distal end surface is located on the electrostatic chuck part side of the insulator, and a tubular insulating wall member is located at the inner side of the sealing member in the radial direction.

公开(公告)号：US20180308737A1

公开(公告)日：2018-10-25

申请号：US15769672

申请日：2016-10-21

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Yoshiaki MORIYA ,  Keigo MAKI ,  Hitoshi KOUNO ,  Kazuto ANDO ,  Yuuki KINPARA

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6833 ,  H01L21/67069 ,  H01L21/683 ,  H02N13/00

Abstract: An electrostatic chuck device comprising: a placing table having a placing surface on which a plate-shaped sample is placed, an electrostatic attraction electrode, which is located on a lower side of the placing table in such a manner that the electrode is located on a surface side opposite to the mounting surface of the placing table, a base part on which at least the placing table and the electrostatic attraction electrode are mounted, a focus ring which surrounds the placing table wherein the focus ring is a continuous ring or is divided into two or more portions, and a lift pin which is movable in an up-down direction and raises the entirety of or at least a part of the focus ring from the base part.

公开(公告)号：US20180269097A1

公开(公告)日：2018-09-20

申请号：US15762056

申请日：2016-09-13

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Shinichi MAETA ,  Yukio MIURA ,  Mamoru KOSAKAI ,  Hitoshi KOUNO

IPC: H01L21/683 ,  H01J37/32

CPC classification number: H01L21/6833 ,  H01J37/32642 ,  H01J37/32724 ,  H01J2237/002 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/6831 ,  H01L21/68735 ,  H02N13/00

Abstract: An electrostatic chuck device according to the present invention includes: an electrostatic chuck portion having a placement surface on which a plate-like sample is placed; a base portion for temperature adjustment disposed in opposition to the side of the electrostatic chuck portion on the opposite side from the placement surface; a bonding portion for bonding the electrostatic chuck portion and the base portion for temperature adjustment together; and an annular focus ring surrounding the periphery of the placement surface, in which the volume of a space surrounded by the electrostatic chuck portion, the focus ring, the bonding portion, and a dam portion of the base portion for temperature adjustment is greater than the amount of volume expansion of the bonding portion at the working temperature.

公开(公告)号：US20170287764A1

公开(公告)日：2017-10-05

申请号：US15510224

申请日：2015-09-24

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Hitoshi KOUNO ,  Kentaro TAKAHASHI ,  Fumihiro GOBOU

IPC: H01L21/683 ,  H05K7/20 ,  H02N13/00

CPC classification number: H01L21/6833 ,  B23Q3/15 ,  H01L21/3065 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68735 ,  H02N13/00 ,  H05K7/20009

Abstract: The present invention provides an electrostatic chuck device capable of increasing the electrostatic adsorptive force for a focus ring and uniformly cooling the focus ring. In an electrostatic chuck device (10) of the present invention, a mounting table (11) has a holder (15) being provided in the periphery of a placing surface (24a) along the circumferential direction of a focus ring (12) and electrostatically adsorbing the focus ring (12), the holder (15) has a pair of banks (16) being provided in the circumferential direction and being for placing the focus ring (12) thereon, and an annular groove (17) formed between these banks, and, in at least a bank (16A) on an outer circumferential position of the focus ring (12) among the pair of the banks (16), a micro-protruding part including a plurality of micro-protrusions is formed on a surface facing the focus ring (12), or convex parts (18) are provided on a bottom (17a) of the groove (17). The convex parts (18) do not come into contact with the focus ring, and the pair of the banks (16) or the plurality of the micro-protrusions comes into contact with the focus ring (12) and electrostatically adsorbs the focus ring (12) in coordination with the convex parts (18).

公开(公告)号：US20170243778A1

公开(公告)日：2017-08-24

申请号：US15515083

申请日：2015-09-09

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Hitoshi KOUNO ,  Fumihiro GOBOU

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6833 ,  H01L21/3065 ,  H01L21/67103 ,  H01L21/6831 ,  H01L21/6875 ,  H02N13/00

Abstract: An electrostatic chuck device that adsorbs a plate-like specimen with an electrostatic adsorption electrode and cools the plate-like specimen, including an electrostatic chuck portion, a forming material of which is a ceramic sintered body, and that has one main surface that is a placement surface on which the plate-like specimen is placed, in which a plurality of protrusions supporting the plate-like specimen are provided on the placement surface, the protrusion has a top surface that is in contact with the plate-like specimen and supports the plate-like specimen, and has a cross-sectional area that gradually increases vertically downward from a height position of the top surface, and a cross-sectional area at a distance 0.6 μm vertically downward from a lower end of the top surface of the protrusion is 110% or less of a cross-sectional area of a lower end of the top surface.