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公开(公告)号：US20180025933A1
公开(公告)日：2018-01-25
申请号：US15550205
申请日：2016-02-03
发明人： Kazunori ISHIMURA , Kazuto ANDO , Kentaro TAKAHASHI , Yuhki KINPARA , Shinichi MAETA , Mamoru KOSAKAI
IPC分类号： H01L21/683 , H01L21/67
CPC分类号： H01L21/6833 , H01L21/67103 , H01L21/67109 , H01L21/6831 , H01L21/68757
摘要： An electrostatic chuck part of an electrostatic chuck device has an electrostatic chuck part inner peripheral surface surrounding an opening of a chuck part through-hole, and an electrostatic chuck part outer peripheral surface surrounding the electrostatic chuck part inner peripheral surface. An insulator has an insulator main body in which an insulator through-hole having an opening on the electrostatic chuck part side is formed, an insulator inner end face, and an insulator outer end face which faces the electrostatic chuck part outer peripheral surface. The insulator inner end face and the electrostatic chuck part inner peripheral surface are in contact with each other, or an adhesion layer or a plasma-resistant adhesive layer extends in a gap between the insulator inner end face and the electrostatic chuck part inner peripheral surface. The plasma-resistant adhesive layer is formed between the electrostatic chuck part outer peripheral surface and the insulator outer end face.
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公开(公告)号：US20210074570A1
公开(公告)日：2021-03-11
申请号：US16970615
申请日：2019-02-19
IPC分类号： H01L21/683 , H01L21/67 , H01J37/32
摘要： An electrostatic chuck device includes: a mounting table provided with amounting surface on which a plate-shaped sample is mounted; an annular focus ring; and a cooling element for cooling the focus ring, in which the mounting table has a holding portion provided to surround the mounting surface, and the holding portion includes an annular groove surrounding the mounting surface, and a through-hole that is open on a bottom surface of the groove, wherein a tubular insulator has been inserted into the through-hole, the holding portion has upper surfaces, which are located on both sides of the groove in a width direction, as holding surfaces that are in contact with the focus ring and hold the focus ring, wherein the holding surface satisfies the following conditions (i) to (iii); (i) surface roughness is 0.05 μm or less, (ii) a flatness is 20 μm or less, and (iii) the holding surface does not have a recess having a depth of 1.0 μm or more and extending in a direction intersecting the holding surface.
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公开(公告)号：US20160240422A1
公开(公告)日：2016-08-18
申请号：US15027026
申请日：2014-10-15
发明人： Kentaro TAKAHASHI , Megumi OOTOMO
IPC分类号： H01L21/683 , H02N13/00
CPC分类号： H01L21/6833 , H01L21/67109 , H01L21/6831 , H02N13/00
摘要： Provided is an electrostatic chuck device in which breakdown between an electrostatic chuck portion and a cooling base portion can be prevented, voltage endurance can be improved, uniformity in the in-plane temperature of a mounting surface of the electrostatic chuck portion where a plate-shaped sample is mounted can be improved, and voltage endurance of a heating member can be improved by applying a uniform voltage between the electrostatic chuck portion and the cooling base portion. An electrostatic chuck device (10) includes: an electrostatic chuck portion (11) that includes a ceramic plate-shaped body and an internal electrode 18 for electrostatic adsorption; and a cooling base portion (12) that adjusts a temperature of the internal electrode (18) for electrostatic adsorption, in which a first insulating member (20) is adhered to a second main surface of the ceramic plate-shaped body through a first adhesive (19) so as to cover a periphery of the internal electrode for electrostatic adsorption (18), a second insulating member (14) is adhered to a top surface of the cooling base portion (12) through a second adhesive (13), a heating member (15) is provided on a top surface of the second insulating member (14), and the electrostatic chuck portion (11) and the cooling base portion (12) are adhered to each other and integrated through an organic adhesive layer (16).
摘要翻译： 提供一种静电卡盘装置，其中可以防止静电卡盘部分和冷却基座部分之间的击穿，可以提高耐电压性能，静电卡盘部分的安装表面的平面内温度的均匀性，其中板状 可以提高样品的安装性，并且通过在静电吸盘部和冷却基部之间施加均匀的电压可以提高加热部件的耐久性。 静电吸盘装置（10）包括：静电吸盘部分（11），其包括陶瓷板状体和用于静电吸附的内部电极18; 以及调节用于静电吸附的内部电极（18）的温度的冷却基部（12），其中第一绝缘构件（20）通过第一粘合剂粘附到陶瓷板状体的第二主表面 （19），以覆盖用于静电吸附的内部电极（18）的周边，第二绝缘构件（14）通过第二粘合剂（13）粘附到冷却基部（12）的顶表面， 加热构件（15）设置在第二绝缘构件（14）的顶表面上，并且静电吸盘部分（11）和冷却基部（12）彼此粘合并通过有机粘合剂层（16） ）。
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公开(公告)号：US20200024196A1
公开(公告)日：2020-01-23
申请号：US16494852
申请日：2018-07-11
IPC分类号： C04B35/575 , C04B35/584 , H05B3/14
摘要： Provided is a SiC sintered body which contains nitrogen atoms, wherein a ratio Rmax/Rave of a maximum volume resistivity Rmax of the sintered body to an average volume resistivity Rave of the sintered body is 1.5 or lower; a ratio Rmin/Rave of a minimum volume resistivity Rmin of the sintered body to the average volume resistivity Rave is 0.7 or higher; and a relative density of the sintered body is 98% or higher.
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5.发明申请公开(公告)号：US20170294331A1
公开(公告)日：2017-10-12
申请号：US15513107
申请日：2015-08-25
IPC分类号： H01L21/683 , C04B35/645 , C04B35/44
CPC分类号： H01L21/6833 , C04B35/44 , C04B35/6263 , C04B35/62655 , C04B35/638 , C04B35/645 , C04B35/6455 , C04B2235/3217 , C04B2235/3224 , C04B2235/5445 , C04B2235/662 , C04B2235/761 , C04B2235/77 , C04B2235/96 , C04B2235/9692
摘要： Provided are a corrosion-resistant member in which, in a case where the corrosion-resistant member is used as a member for an electrostatic chuck, an adsorption force of the electrostatic chuck can be made to be strong when an electric field is applied and a residual adsorption force of the electrostatic chuck can be made to be weak when the application of the electric field is stopped; a member for an electrostatic chuck; and a process for producing a corrosion-resistant member. The corrosion-resistant member includes an oxide which includes samarium and aluminum and has a perovskite type structure. The member for an electrostatic chuck includes the corrosion-resistant member according to the present invention. The process for producing a corrosion-resistant member according to the present invention includes: a step of mixing aluminum oxide powder and samarium oxide powder with a solvent to prepare a slurry including the aluminum oxide powder and the samarium oxide powder; a step of drying the slurry to prepare a mixed powder including the aluminum powder and the samarium oxide powder, and molding the mixed powder to prepare a green body; and a step of calcinating the green body to prepare a sintered body.
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公开(公告)号：US20170287764A1
公开(公告)日：2017-10-05
申请号：US15510224
申请日：2015-09-24
发明人： Hitoshi KOUNO , Kentaro TAKAHASHI , Fumihiro GOBOU
IPC分类号： H01L21/683 , H05K7/20 , H02N13/00
CPC分类号： H01L21/6833 , B23Q3/15 , H01L21/3065 , H01L21/67109 , H01L21/6831 , H01L21/68735 , H02N13/00 , H05K7/20009
摘要： The present invention provides an electrostatic chuck device capable of increasing the electrostatic adsorptive force for a focus ring and uniformly cooling the focus ring. In an electrostatic chuck device (10) of the present invention, a mounting table (11) has a holder (15) being provided in the periphery of a placing surface (24a) along the circumferential direction of a focus ring (12) and electrostatically adsorbing the focus ring (12), the holder (15) has a pair of banks (16) being provided in the circumferential direction and being for placing the focus ring (12) thereon, and an annular groove (17) formed between these banks, and, in at least a bank (16A) on an outer circumferential position of the focus ring (12) among the pair of the banks (16), a micro-protruding part including a plurality of micro-protrusions is formed on a surface facing the focus ring (12), or convex parts (18) are provided on a bottom (17a) of the groove (17). The convex parts (18) do not come into contact with the focus ring, and the pair of the banks (16) or the plurality of the micro-protrusions comes into contact with the focus ring (12) and electrostatically adsorbs the focus ring (12) in coordination with the convex parts (18).
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