公开(公告)号：US11141363B2

公开(公告)日：2021-10-12

申请号：US16476109

申请日：2018-01-05

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Tetsuro Itagaki ,  Hirokazu Matsushita ,  Norito Morishita

IPC: A61K8/06 ,  A61K8/25 ,  A61K8/58 ,  A61Q17/04 ,  A61K8/27 ,  A61K8/28

Abstract: In an ultraviolet-shielding particle coated with silicon oxide of the present invention, a surface of the ultraviolet-shielding particle is coated with a silicon oxide coat, at least one functional group selected from the group consisting of an alkyl group, an alkenyl group, and a cycloalkyl group is present on a surface of the silicon oxide coat, and a content of the functional group is 0.0001% by mass or more and 0.30% by mass or less.

公开(公告)号：US11837489B2

公开(公告)日：2023-12-05

申请号：US16981622

申请日：2019-03-22

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Hironori Kugimoto ,  Norito Morishita

IPC: H01L21/683 ,  H01J37/32 ,  H01L21/687

CPC classification number: H01L21/6833 ,  H01J37/32724 ,  H01L21/68757

Abstract: The electrostatic chuck device includes: a base having one main surface serving as a mounting surface on which a plate-shaped sample is mounted; and an electrode for electrostatic attraction provided on a side opposite to the mounting surface in the base or in an interior of the base, in which the electrode for electrostatic attraction is made of a composite sintered body that includes a matrix phase having insulation properties and a dispersed phase having a lower volume resistivity value than the matrix phase, in any cross section of the composite sintered body, a region of the dispersed phase, which is surrounded by the matrix phase and is independent, includes aggregated portions having a maximum Feret diameter of 30 μm or more, and one or more of the aggregated portions are present in a range of 2500 μm2 in any cross section of the sintered body.

公开(公告)号：US11328948B2

公开(公告)日：2022-05-10

申请号：US16761891

申请日：2019-07-19

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Masaki Ozaki ,  Norito Morishita

IPC: H01T23/00 ,  H01L21/683 ,  B23Q3/15 ,  H01L21/67 ,  H01L21/687 ,  H02N13/00

Abstract: An electrostatic chuck device (1) including: an electrostatic chuck part (2) which includes a base material (11) having a mounting surface (11a) on which a plate-like sample W is mounted, and an internal electrostatic attraction electrode (13) which electrostatically attracts the plate-like sample (W) to the mounting surface (11a); a cooling base part (3) which is configured to cool the electrostatic chuck part (2); and an adhesive layer (4) which is interposed therebetween, in which a shape of the mounting surface of the base material (11) includes a concave surface (23) or a convex surface, which is a curved surface that gradually curves from a center (11b) of the mounting surface (11a) toward an outer periphery (11c) of the mounting surface (11a) and includes no inflection point, and an absolute value of a difference between a height of a center of the concave surface (23) or the convex surface from a position of a main surface (3a) of the cooling base part (3) as a reference and a height of an outer periphery of the concave surface (23) or the convex surface from the position of the main surface (3a) of the cooling base part (3) as a reference is 1 μm or higher and 30 μm or lower.