公开(公告)号：US20180308737A1

公开(公告)日：2018-10-25

申请号：US15769672

申请日：2016-10-21

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Yoshiaki MORIYA ,  Keigo MAKI ,  Hitoshi KOUNO ,  Kazuto ANDO ,  Yuuki KINPARA

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6833 ,  H01L21/67069 ,  H01L21/683 ,  H02N13/00

Abstract: An electrostatic chuck device comprising: a placing table having a placing surface on which a plate-shaped sample is placed, an electrostatic attraction electrode, which is located on a lower side of the placing table in such a manner that the electrode is located on a surface side opposite to the mounting surface of the placing table, a base part on which at least the placing table and the electrostatic attraction electrode are mounted, a focus ring which surrounds the placing table wherein the focus ring is a continuous ring or is divided into two or more portions, and a lift pin which is movable in an up-down direction and raises the entirety of or at least a part of the focus ring from the base part.