公开(公告)号：US20180025933A1

公开(公告)日：2018-01-25

申请号：US15550205

申请日：2016-02-03

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Kazunori ISHIMURA ,  Kazuto ANDO ,  Kentaro TAKAHASHI ,  Yuhki KINPARA ,  Shinichi MAETA ,  Mamoru KOSAKAI

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6833 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68757

Abstract: An electrostatic chuck part of an electrostatic chuck device has an electrostatic chuck part inner peripheral surface surrounding an opening of a chuck part through-hole, and an electrostatic chuck part outer peripheral surface surrounding the electrostatic chuck part inner peripheral surface. An insulator has an insulator main body in which an insulator through-hole having an opening on the electrostatic chuck part side is formed, an insulator inner end face, and an insulator outer end face which faces the electrostatic chuck part outer peripheral surface. The insulator inner end face and the electrostatic chuck part inner peripheral surface are in contact with each other, or an adhesion layer or a plasma-resistant adhesive layer extends in a gap between the insulator inner end face and the electrostatic chuck part inner peripheral surface. The plasma-resistant adhesive layer is formed between the electrostatic chuck part outer peripheral surface and the insulator outer end face.

公开(公告)号：US20180308737A1

公开(公告)日：2018-10-25

申请号：US15769672

申请日：2016-10-21

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Yoshiaki MORIYA ,  Keigo MAKI ,  Hitoshi KOUNO ,  Kazuto ANDO ,  Yuuki KINPARA

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6833 ,  H01L21/67069 ,  H01L21/683 ,  H02N13/00

Abstract: An electrostatic chuck device comprising: a placing table having a placing surface on which a plate-shaped sample is placed, an electrostatic attraction electrode, which is located on a lower side of the placing table in such a manner that the electrode is located on a surface side opposite to the mounting surface of the placing table, a base part on which at least the placing table and the electrostatic attraction electrode are mounted, a focus ring which surrounds the placing table wherein the focus ring is a continuous ring or is divided into two or more portions, and a lift pin which is movable in an up-down direction and raises the entirety of or at least a part of the focus ring from the base part.