公开(公告)号：US20180356319A1

公开(公告)日：2018-12-13

申请号：US16047520

申请日：2018-07-27

Applicant: SYSMEX CORPORATION

Inventor： Takaaki NAGAI ,  Noriyuki NAKANISHI ,  Seiya SHINABE ,  Tetsuya ODA ,  Mitsuo YAMASAKI ,  Hiroyuki KOGA

IPC: G01N1/31 ,  G01N1/28

CPC classification number: G01N1/312 ,  G01N1/28 ,  G01N1/2813 ,  G01N1/30

Abstract: A smear staining apparatus may include: a chamber part in which glass slides can be placed and that is configured to contain a staining solution for staining a smear on each of the glass slides; a cover part that covers the chamber part from above and comprises an insertion hole through which the glass slides are transported to the chamber part; and a transport part that transports the glass slides to the chamber part through the insertion hole.

公开(公告)号：US20220357248A1

公开(公告)日：2022-11-10

申请号：US17869818

申请日：2022-07-21

Applicant: SYSMEX CORPORATION

Inventor： Takaaki NAGAI ,  Noriyuki NAKANISHI ,  Seiya SHINABE ,  Tetsuya ODA ,  Mitsuo YAMASAKI ,  Hiroyuki KOGA

IPC: G01N1/31 ,  G01N1/30 ,  G01N1/28

Abstract: A smear staining apparatus may include: a chamber part in which glass slides can be placed and that is configured to contain a staining solution for staining a smear on each of the glass slides; a cover part that covers the chamber part from above and comprises an insertion hole through which the glass slides are transported to the chamber part; and a transport part that transports the glass slides to the chamber part through the insertion hole.

公开(公告)号：US20180290181A1

公开(公告)日：2018-10-11

申请号：US15944986

申请日：2018-04-04

Applicant: SYSMEX CORPORATION

Inventor： Mitsuo YAMASAKI ,  Noriyuki NAKANISHI ,  Masahiko FUKUSHIMA ,  Hiroyuki KOGA

IPC: B08B3/08 ,  G01N1/28 ,  C11D3/04 ,  B08B7/02 ,  B08B3/04 ,  B05C11/02

CPC classification number: B08B3/08 ,  B05C11/023 ,  B08B3/041 ,  B08B7/028 ,  C11D3/04 ,  C11D3/046 ,  G01N1/2813 ,  G01N1/312 ,  G01N35/00029 ,  G01N35/026 ,  G01N2035/00039 ,  G01N2035/00089 ,  G01N2035/00138

Abstract: Disclosed is a method for washing a smearing member, the method including: dropping a washing agent on a glass slide; and causing the smearing member to be in contact with the washing agent on the glass slide, to wash the smearing member.

公开(公告)号：US20220357245A1

公开(公告)日：2022-11-10

申请号：US17873886

申请日：2022-07-26

Applicant: SYSMEX CORPORATION

Inventor： Shogo KUBOTA ,  Seiya SHINABE ,  Hiroyuki KOGA ,  Noriyuki NAKANISHI ,  Yuichiro OHMAE ,  Toshihisa TANAKA ,  Tetsuya ODA

IPC: G01N1/28 ,  G01N1/30 ,  G01N35/04 ,  G01N33/48 ,  G01N35/00 ,  G01N1/31

Abstract: Disclosed is a specimen smearing apparatus including: a slide supplying section configured to supply a glass slide yet to be processed; a first processing section configured to perform a first process on the glass slide, the first processing section being disposed in a first direction with respect to the slide supplying section, the first direction being a far direction of an apparatus body of the specimen smearing apparatus; a second processing section configured to perform on the glass slide a second process which is different from the first process, the second processing section being disposed in a second direction with respect to the first processing section, the second direction being a left-right direction of the apparatus body and orthogonal to the first direction; and a first drying processing section disposed in a third direction with respect to the second processing section, the third direction being a near direction of the apparatus body and opposite to the first direction, the first drying processing section configured to dry a specimen on the glass slide on which the first process and the second process have been performed, wherein one of the first processing section and the second processing section is configured to perform a smearing process for smearing a specimen on the glass slide.

公开(公告)号：US20200348214A1

公开(公告)日：2020-11-05

申请号：US16934918

申请日：2020-07-21

Applicant: SYSMEX CORPORATION

Inventor： Shogo KUBOTA ,  Seiya SHINABE ,  Hiroyuki KOGA ,  Noriyuki NAKANISHI ,  Yuichiro OHMAE ,  Toshihisa TANAKA ,  Tetsuya ODA

IPC: G01N1/28 ,  G01N1/30 ,  G01N35/04 ,  G01N33/48 ,  G01N35/00 ,  G01N1/31

Abstract: Disclosed is a specimen smearing apparatus including: a slide supplying section configured to supply a glass slide yet to be processed; a first processing section configured to perform a first process on the glass slide, the first processing section being disposed in a first direction with respect to the slide supplying section, the first direction being a far direction of an apparatus body of the specimen smearing apparatus; a second processing section configured to perform on the glass slide a second process which is different from the first process, the second processing section being disposed in a second direction with respect to the first processing section, the second direction being a left-right direction of the apparatus body and orthogonal to the first direction; and a first drying processing section disposed in a third direction with respect to the second processing section, the third direction being a near direction of the apparatus body and opposite to the first direction, the first drying processing section configured to dry a specimen on the glass slide on which the first process and the second process have been performed, wherein one of the first processing section and the second processing section is configured to perform a smearing process for smearing a specimen on the glass slide.

公开(公告)号：US20180188140A1

公开(公告)日：2018-07-05

申请号：US15906456

申请日：2018-02-27

Applicant: SYSMEX CORPORATION

Inventor： Shogo KUBOTA ,  Seiya SHINABE ,  Hiroyuki KOGA ,  Noriyuki NAKANISHI ,  Yuichiro OHMAE ,  Toshihisa TANAKA ,  Tetsuya ODA

IPC: G01N1/28 ,  G01N1/31 ,  G01N1/30 ,  G01N35/04

Abstract: Disclosed is a specimen smearing apparatus including: a slide supplying section configured to supply a glass slide yet to be processed; a first processing section configured to perform a first process on the glass slide, the first processing section being disposed in a first direction with respect to the slide supplying section, the first direction being a far direction of an apparatus body of the specimen smearing apparatus; a second processing section configured to perform on the glass slide a second process which is different from the first process, the second processing section being disposed in a second direction with respect to the first processing section, the second direction being a left-right direction of the apparatus body and orthogonal to the first direction; and a first drying processing section disposed in a third direction with respect to the second processing section, the third direction being a near direction of the apparatus body and opposite to the first direction, the first drying processing section configured to dry a specimen on the glass slide on which the first process and the second process have been performed, wherein one of the first processing section and the second processing section is configured to perform a smearing process for smearing a specimen on the glass slide.