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公开(公告)号:US20240076771A1
公开(公告)日:2024-03-07
申请号:US18321376
申请日:2023-05-22
Applicant: Samsung Display Co., Ltd.
Inventor: KYONGHO HONG , MYUNGKYU KIM , SUNGHO PARK , CHANG-KON PARK , SUKBEOM YOU , DONGJAE LEE
CPC classification number: C23C14/042 , C23C14/24 , H10K59/1201
Abstract: A mask stage includes a stage inclined with respect to a vertical direction perpendicular to a plane defined by a first direction and a second direction intersecting each other, a plurality of first support units disposed between the stage and a mask frame disposed above the stage, and a plurality of second support units disposed on the stage and being adjacent to a lower side of the mask frame. The lower side of the mask frame extends in a first direction, and the second support units are respectively disposed under end portions of the lower side of the mask frame, which are opposite to each other in the first direction.
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公开(公告)号:US20190308276A1
公开(公告)日:2019-10-10
申请号:US16375582
申请日:2019-04-04
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: TOSHINARU SUZUKI , DOKYUN KWON , JAEBUM PAHK , JINWON BAEK , JEONGHO YI , JINPYUNG LEE , KYONGHO HONG
IPC: B23K26/38 , H01L21/687 , B23K26/70
Abstract: A substrate processing apparatus includes the following: a support frame, first stage, a suction part, and a plurality of island-type second stages. The support frame is disposed on the first stage. The height of the support frame is lower than the height of the first stage. A plurality of island-type second stages are disposed on the support frame on the same plane as the first stage. The suction part is disposed on the support frame.
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公开(公告)号:US20240376586A1
公开(公告)日:2024-11-14
申请号:US18643553
申请日:2024-04-23
Applicant: Samsung Display Co., LTD.
Inventor: SUNGHO PARK , KYONGHO HONG
Abstract: A mask assembly manufacturing device includes: a support part including a first support part and a second support part; a stage disposed on the second support part; support units configured to support the mask frame; and first guide units configured to overlap corner parts of the mask frame, where each of the first guide units includes: a first base part; a first cover part having a first opening defined therein; a first tilting part of which one portion is disposed inside the first cover part and another portion protrudes from the first cover part to an outside through the first opening; a first guide part connected to the first base part and the first tilting part; and a first elastic part connected to the first base part and the first tilting part.
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公开(公告)号:US20240084433A1
公开(公告)日:2024-03-14
申请号:US18239508
申请日:2023-08-29
Applicant: Samsung Display Co., LTD.
Inventor: KYONGHO HONG , SUNGHO PARK , JUNGSEOB LEE , JUNHYEUK KO , EUIGYU KIM , SANG MIN YI , SANGJIN HAN
CPC classification number: C23C14/042 , H10K71/166
Abstract: A stage unit includes a stage that provides a seating surface and has an opening formed through the seating surface, a first support unit disposed below the opening and coupled to the stage, a second support unit disposed below the opening and coupled to the stage, where the second support unit is spaced apart from the first support unit on a plane, and a flatness measurement unit supported by the first support unit. Each of the first support unit and the second support unit provides a support surface that crosses the seating surface, and the support surface of the first support unit and the support surface of the second support unit are movable in a direction toward and away from the opening.
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公开(公告)号:US20230292482A1
公开(公告)日:2023-09-14
申请号:US18174513
申请日:2023-02-24
Applicant: Samsung Display Co., Ltd.
Inventor: MYUNGKYU KIM , KYONGHO HONG , CHANG-KON PARK , SUKBEOM YOU , DONGJAE LEE
CPC classification number: H05K13/0812 , H05K13/0015
Abstract: A mapping device includes: a substrate engraved with an alignment pattern; an electrostatic chuck under the substrate and in contact with the substrate; and an anti-separation frame on the substrate and preventing the substrate from being separated.
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