专利检索 ap:("Samsung Display Co., Ltd.") AND inv:"DONGHUN LEE" 第 1 页

1.

发明申请
ETCHING COMPOSITION FOR THIN FILM CONTAINING SILVER, METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING A DISPLAY DEVICE USING THE SAME 有权

公开(公告)号：US20220204846A1

公开(公告)日：2022-06-30

申请号：US17388712

申请日：2021-07-29

申请人： Samsung Display Co., Ltd.

发明人： JONGHEE PARK , HYOUNG SIK KIM , O Byoung Kwon , Gi-Yong Nam , Kyungchan Min , SUCK JUN LEE , YOUNGMIN KIM , JINHYUNG KIM , DONGHUN LEE , KYU-HUN LIM , DONGMIN JANG

IPC分类号： C09K13/06 , C23F1/44 , C23F1/02 , H01L51/00

摘要： An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.

2.

发明公开
ETCHING COMPOSITION FOR THIN FILM CONTAINING SILVER, METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING A DISPLAY DEVICE USING THE SAME 审中-公开

公开(公告)号：US20230220280A1

公开(公告)日：2023-07-13

申请号：US18122706

申请日：2023-03-17

申请人： Samsung Display Co., Ltd.

发明人： JONGHEE PARK , HYOUNG SIK KIM , O Byoung Kwon , Gi-Yong Nam , Kyungchan Min , SUCK JUN LEE , YOUNGMIN KIM , JINHYUNG KIM , DONGHUN LEE , KYU-HUN LIM , DONGMIN JANG

IPC分类号： H10K71/00 , C09K13/06 , H10K59/12

CPC分类号： H10K71/621 , C09K13/06 , H10K59/1201

摘要： An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.