公开(公告)号：US20220204846A1

公开(公告)日：2022-06-30

申请号：US17388712

申请日：2021-07-29

Applicant: Samsung Display Co., Ltd.

Inventor： JONGHEE PARK ,  HYOUNG SIK KIM ,  O Byoung Kwon ,  Gi-Yong Nam ,  Kyungchan Min ,  SUCK JUN LEE ,  YOUNGMIN KIM ,  JINHYUNG KIM ,  DONGHUN LEE ,  KYU-HUN LIM ,  DONGMIN JANG

IPC: C09K13/06 ,  C23F1/44 ,  C23F1/02 ,  H01L51/00

Abstract: An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.

公开(公告)号：US20250072226A1

公开(公告)日：2025-02-27

申请号：US18749749

申请日：2024-06-21

Applicant: Samsung Display Co., LTD.

Inventor： JONGHEE PARK ,  HYOUNG SIK KIM ,  ILWOO PARK

IPC: H10K59/122 ,  H10K59/12 ,  H10K59/80 ,  H10K59/88 ,  H10K71/60

Abstract: A display panel includes: a base layer; a first electrode disposed on the base layer; a pixel-defining film in which a light-emitting opening partially exposing the first electrode is defined, and which is disposed on the base layer; a first conductive partition wall in which a first partition wall opening overlapping the light-emitting opening in a plan view is defined, and which is disposed on the pixel-defining film; a second conductive partition wall in which a second partition wall opening overlapping the first partition wall opening, and a dummy opening overlapping the first conductive partition wall in the plan view are defined, and which is disposed on the first conductive partition wall; a second electrode disposed on the first electrode, and a light-emitting pattern disposed between the first electrode and the second electrode.

公开(公告)号：US20230220280A1

公开(公告)日：2023-07-13

申请号：US18122706

申请日：2023-03-17

Applicant: Samsung Display Co., Ltd.

Inventor： JONGHEE PARK ,  HYOUNG SIK KIM ,  O Byoung Kwon ,  Gi-Yong Nam ,  Kyungchan Min ,  SUCK JUN LEE ,  YOUNGMIN KIM ,  JINHYUNG KIM ,  DONGHUN LEE ,  KYU-HUN LIM ,  DONGMIN JANG

IPC: H10K71/00 ,  C09K13/06 ,  H10K59/12

CPC classification number: H10K71/621 ,  C09K13/06 ,  H10K59/1201

Abstract: An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.