Sputtering apparatus and method
    1.
    发明授权

    公开(公告)号:US09715997B2

    公开(公告)日:2017-07-25

    申请号:US14226564

    申请日:2014-03-26

    Abstract: A sputtering apparatus includes: a first cylindrical target unit, a second cylindrical target unit facing the first cylindrical target unit; a third cylindrical target unit facing the first cylindrical target unit and the second cylindrical target unit; a fourth cylindrical target unit facing the first cylindrical target unit, the second cylindrical target unit, and the third cylindrical target unit; and a power unit configured to provide power such that two of the first cylindrical target unit, the second cylindrical target unit, the third cylindrical target unit, and the fourth cylindrical target unit function as different electrodes.

    SPUTTERING APPARATUS AND METHOD
    2.
    发明申请
    SPUTTERING APPARATUS AND METHOD 有权
    溅射装置和方法

    公开(公告)号:US20150041310A1

    公开(公告)日:2015-02-12

    申请号:US14226564

    申请日:2014-03-26

    Abstract: A sputtering apparatus includes: a first cylindrical target unit, a second cylindrical target unit facing the first cylindrical target unit; a third cylindrical target unit facing the first cylindrical target unit and the second cylindrical target unit; a fourth cylindrical target unit facing the first cylindrical target unit, the second cylindrical target unit, and the third cylindrical target unit; and a power unit configured to provide power such that two of the first cylindrical target unit, the second cylindrical target unit, the third cylindrical target unit, and the fourth cylindrical target unit function as different electrodes.

    Abstract translation: 溅射装置包括:第一圆柱形目标单元,面向第一圆柱形目标单元的第二圆柱形目标单元; 面向所述第一圆筒形目标单元和所述第二圆柱形目标单元的第三圆柱形目标单元; 面向第一圆筒形目标单元的第四圆柱形目标单元,第二圆柱形目标单元和第三圆柱形目标单元; 以及功率单元,被配置为提供功率,使得第一圆柱形靶单元,第二圆柱形目标单元,第三圆柱形目标单元和第四圆柱形目标单元中的两个用作不同的电极。

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