DEPOSITION APPARATUS AND DEPOSITION METHOD USING DEPOSITION APPARATUS

    公开(公告)号:US20230407452A1

    公开(公告)日:2023-12-21

    申请号:US18314231

    申请日:2023-05-09

    CPC classification number: C23C14/042

    Abstract: A deposition apparatus and a deposition method by using the deposition apparatus are provided. The deposition apparatus includes a mask including deposition openings, a mask frame supporting the mask and including first, second, third, and fourth portions and an opening overlapping the deposition openings and surrounded by the first, second, third, and fourth portions, a stage disposed on a rear surface of the mask frame, a pin unit connected to the stage, and a magnet unit disposed on a rear surface of the stage and overlapping the mask frame. The first portion and the second portion of the mask frame extend in a first direction, and the third portion and the fourth portion of the mask frame extend in a second direction intersecting the first direction, and the pin unit supports a side surface of the first portion of the mask frame and is movable in the second direction.

    MASK AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20220035250A1

    公开(公告)日:2022-02-03

    申请号:US17330841

    申请日:2021-05-26

    Abstract: A mask includes a mask sheet provided with a plurality of open areas defined therein in a plan view and a mask frame which supports the mask sheet. The mask sheet includes a first portion including a first surface, where the first surface is configured to be in contact with a target substrate, and a second portion disposed on the first portion, extending from a top of the first portion in a first direction and including a second surface defining the open area. The second surface is an inclined surface inclined downward with respect to the first direction, and the first direction is parallel to a plane in which the first surface is included.

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