公开(公告)号：US20240145243A1

公开(公告)日：2024-05-02

申请号：US18235797

申请日：2023-08-18

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： CHEOLHO PARK ,  JEKIL RYU ,  JEONGHUN WOO ,  DOO-WON LEE ,  HAESOOK LEE ,  JIN HONG JEUN

IPC: H01L21/02

CPC classification number: H01L21/02686 ,  H01L21/02691 ,  H10K59/1201

Abstract: A laser annealing method includes selecting a reference intensity from a plurality of intensities of a plurality of peaks; where the reference intensity is used to determine a pulse shape of laser irradiation during laser annealing, setting the pulse shape by setting an intensity ratio of a first peak having a smallest peak occurrence time among the plurality of peaks to less than about 100 percent relative to the reference intensity, and irradiating a laser beam having the pulse shape to a stage.

公开(公告)号：US20230135789A1

公开(公告)日：2023-05-04

申请号：US17872331

申请日：2022-07-25

Applicant: Samsung Display Co., Ltd.

Inventor： JIN HONG JEUN ,  AKIFUMI SANGU ,  JEKIL RYU ,  CHEOLHO PARK ,  JEONGHUN WOO ,  HAESOOK LEE ,  YOUNGSU CHAE

IPC: B23K26/06 ,  B23K26/0622 ,  B23K26/064 ,  B23K26/352

Abstract: A laser annealing apparatus includes a plurality of lasers, a laser controller that controls the plurality of lasers such that a plurality of laser beams generated from the plurality of lasers is emitted at different timings, beam mixer optics that outputs a processing beam by mixing the plurality of laser beams of which output timings are adjusted, and focus optics that outputs the processing beam of which focus is adjusted. The processing beam includes a first processing laser beam having a first pulse, a second processing laser beam having a second pulse following the first pulse, and a third processing laser beam having a third pulse following the second pulse. A first peak of the first pulse is smaller than a second peak of the second pulse, and a third peak of the third pulse is smaller than the second peak.