OPTICAL FILTER SUBSTRATE AND DISPLAY DEVICE INCLUDING THE SAME

    公开(公告)号:US20210249479A1

    公开(公告)日:2021-08-12

    申请号:US17242387

    申请日:2021-04-28

    摘要: A display device includes an optical filter substrate including: a substrate; a first color filter on the substrate; a second color filter on the substrate, the second color filter spaced apart from the first color filter; a first color conversion element on the first color filter, the first color conversion element converting incident light into light of a first color; a second color conversion element on the second color filter, the second color conversion element converting the incident light into light of a second color; and a black matrix located between the first color conversion element and the second color conversion element, and between the first color filter and the second color filter.

    Display apparatus and method of manufacturing the same

    公开(公告)号:US11088356B2

    公开(公告)日:2021-08-10

    申请号:US16707818

    申请日:2019-12-09

    IPC分类号: H01L51/56 H01L51/52 H01L51/00

    摘要: In a method of manufacturing a display apparatus, the method includes: providing a first mother substrate; forming, on the first mother substrate, a pixel layer comprising a light-emitting device; providing a second mother substrate; forming, on the second mother substrate, a diffraction pattern layer configured to diffract light emitted from the light-emitting device; forming a bonded substrate structure by bonding the first mother substrate, on which the pixel layer is formed, and the second mother substrate, on which the diffraction pattern layer is formed; forming, by cutting the bonded substrate structure, a plurality of unit substrate structures each comprising a first substrate on which the pixel layer is formed and a second substrate on which the diffraction pattern layer is formed; forming a protection member on the diffraction pattern layer; and removing a foreign material on the diffraction pattern layer with the protection member.

    Photo mask and method of manufacturing semiconductor element using photo mask

    公开(公告)号:US10719009B2

    公开(公告)日:2020-07-21

    申请号:US16184431

    申请日:2018-11-08

    摘要: A photo mask includes a transparent substrate, a transflective member, and a light shielding member. The transparent substrate has a transflective region including a first region, a second region located in opposing lateral portions of the first region, and an edge region located adjacent to the first and second regions, and a light shielding region surrounding the transflective region. The transflective member is disposed in the first, second and edge regions under the transparent substrate, and has a different light transmittance in each of the first, second and edge regions. The light shielding member is disposed in the light shielding region under the transparent substrate, and defines an opening which exposes the transflective region. The light shielding member includes a long side extending in a first direction parallel to an upper surface of the transparent substrate and a short side extending in a second direction.

    Electronic panel and method for manufacturing the same

    公开(公告)号:US10957747B2

    公开(公告)日:2021-03-23

    申请号:US16440788

    申请日:2019-06-13

    摘要: An electronic device includes an electronic panel including an active area and a pad area and including an input sensing member and a circuit board overlapping at least a side of the pad area. The electronic panel includes a first conductive layer, a second conductive layer, a first organic insulation layer disposed between the first conductive layer and the second conductive layer, a pattern layer disposed on the second conductive layer, overlapping the plurality of second conductive patterns, and including a plurality of organic patterns, and a second organic insulation layer covering the pattern layer and the second conductive layer. The pattern layer covers an upper surface of the second conductive layer.