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Patent Agency Ranking
1.发明授权公开(公告)号：US10773427B2
公开(公告)日：2020-09-15
申请号：US15652184
申请日：2017-07-17
Applicant: Samsung Display Co., Ltd.
Inventor： Daehwan Jang , Seung-Won Park , Baehyoun Jung , Eunjung Kim , Jihun Kim , Yunjong Yeo , Hyungbin Cho , Sang-Hoon Lee , Yong-Hwan Ryu , Sung-Young Choi , Hyunju Kang
Abstract: A method of manufacturing a roll type imprint master mold including disposing a base layer on a substrate including a first area and a second area adjacent to the first area, disposing an inorganic insulation layer on the base layer, forming a first mask pattern and a first resin pattern in the first area, forming a pattern layer by etching the inorganic insulation layer using the first resin and the first mask patterns as a mask, removing the first resin and the first mask patterns, forming a second mask pattern and a second resin pattern in the second area, forming a pattern layer by etching the inorganic insulation layer using the second resin and the second mask patterns as a mask, removing the second resin and the second mask patterns, separating the base layer from the substrate, and attaching the base layer onto a roll body.
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2.发明授权公开(公告)号：US09070715B2
公开(公告)日：2015-06-30
申请号：US13716972
申请日：2012-12-17
Applicant: Samsung Display Co., Ltd.
Inventor： Sangwon Shin , Hyunju Kang , Sangwoo Sohn , Sukyoung Yang , Changoh Jeong
IPC: H01L23/34 , H01L29/66 , H01L21/324 , H01L21/67 , H01L21/677 , H01L27/12
CPC classification number: H01L29/66742 , H01L21/324 , H01L21/67109 , H01L21/67201 , H01L21/67745 , H01L27/1262
Abstract: Provided is a method for fabricating an array substrate. The method for fabricating the array substrate includes forming a semiconductor layer on a substrate, forming a gate electrode which is insulated from the semiconductor layer, forming source and drain electrodes which are insulated from the gate electrode and connected to the semiconductor layer, and forming a pixel electrode connected to the drain electrode. Here, at least one of the forming of the gate electrode, the forming of the source and drain electrodes, and the forming of the pixel electrode includes forming a conductive layer on the substrate, cooling the substrate on which the conductive layer is formed to a temperature of no greater than about 0° C., heating the cooled substrate, and patterning the conductive layer.
Abstract translation: 提供了一种制造阵列基板的方法。 制造阵列基板的方法包括在基板上形成半导体层，形成与半导体层绝缘的栅电极，形成与栅电极绝缘并连接到半导体层的源电极和漏电极，并形成 像素电极连接到漏电极。 这里，形成栅电极，形成源电极和漏电极以及形成像素电极中的至少一个包括在衬底上形成导电层，将形成有导电层的衬底冷却到 温度不大于约0℃，加热冷却的基底，并图形化导电层。
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公开(公告)号：US11088356B2
公开(公告)日：2021-08-10
申请号：US16707818
申请日：2019-12-09
Applicant: Samsung Display Co., Ltd.
Inventor： Woongsik Kim , Taewook Kang , Jeongmin Park , Hyeyong Chu , Hoon Kang , Hyunju Kang , Janghyun Kim
Abstract: In a method of manufacturing a display apparatus, the method includes: providing a first mother substrate; forming, on the first mother substrate, a pixel layer comprising a light-emitting device; providing a second mother substrate; forming, on the second mother substrate, a diffraction pattern layer configured to diffract light emitted from the light-emitting device; forming a bonded substrate structure by bonding the first mother substrate, on which the pixel layer is formed, and the second mother substrate, on which the diffraction pattern layer is formed; forming, by cutting the bonded substrate structure, a plurality of unit substrate structures each comprising a first substrate on which the pixel layer is formed and a second substrate on which the diffraction pattern layer is formed; forming a protection member on the diffraction pattern layer; and removing a foreign material on the diffraction pattern layer with the protection member.
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公开(公告)号：US10761630B2
公开(公告)日：2020-09-01
申请号：US15642580
申请日：2017-07-06
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Hyuneok Shin , Dokeun Song , Sangwon Shin , Dongmin Lee , Hyunju Kang , Chanwoo Yang , Juhyun Lee , Gwangmin Cha
IPC: H01L51/52 , G06F3/041 , G02F1/1333 , G02F1/1343 , G06F3/044
Abstract: A display substrate, a display device, and a touch panel, the display substrate including a base substrate; and an electrode on the base substrate, the electrode including a first light transmitting layer, wherein the first light transmitting layer has a work function ranging from about 4.75 eV to about 4.9 eV, the first light transmitting layer includes a first transparent conductive oxide (TCO) layer and a first metal element doped in the first transparent conductive oxide layer, the first metal element being a group 2 metal element, the first metal element is included in the first light transmitting layer in an amount of about 0.01 atomic percent (atomic %) to about 5.00 atomic %, based on a total number of atoms in the first light transmitting layer.
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公开(公告)号：US09599869B2
公开(公告)日：2017-03-21
申请号：US14099971
申请日：2013-12-08
Applicant: Samsung Display Co., Ltd.
Inventor： Joonyong Park , Sanggab Kim , Changoh Jeong , Taeho Kang , Kyungseop Kim , Gwan Ha Kim , Byeong-Beom Kim , Honglong Ning , Sangwon Shin , Sukyoung Yang , Yunjong Yeo , Dongmin Lee , Shin Il Choi , Hyunju Kang , Sangwoo Sohn , Jungha Son , Yu-Gwang Jeong , Gugrae Jo , Jinho Hwang
IPC: G02F1/1335 , G02F1/1362
CPC classification number: G02F1/136286 , G02F2001/133548 , G02F2001/13629 , G02F2201/38
Abstract: A display apparatus includes a backlight assembly which generates a light and a display panel which receives the light to display an image, the display panel including a first substrate, a second substrate which faces the first substrate and is disposed closer to the backlight assembly than the first substrate, a gate line disposed on the first substrate, a data line disposed on the gate line and insulated from the gate line, a thin film transistor disposed on the first substrate and electrically connected to the gate line and the data line, and a reflection preventing layer disposed between the first substrate and the gate line to reduce an amount of a reflected light reflected by the gate line.
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